WorldCat Identities

Lévy, Roland

Overview
Works: 18 works in 83 publications in 4 languages and 1,999 library holdings
Genres: Conference papers and proceedings 
Roles: Author, Editor, Other
Publication Timeline
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Most widely held works by Roland Lévy
Amorphous magnetism--II by Roland A Levy( Book )

12 editions published in 1977 in English and held by 162 WorldCat member libraries worldwide

The papers making up this volume represent a summary of the proceedings of the Second International Symposium on Amorphous Magnetism held at Rensselaer Polytechnic Institute on August 25- 27, 1976. As a result of the resounding success of the Inter national Symposium on Amorphous Magnetism held at Wayne State University on August 17 and 18, 1972 this symposium was again organized with the purpose in mind of providing a forum for dis cussion of the most recent theoretical and experimental advances made in the fields of spin glass systems, amorphous magnetic alloys and magnetic oxide glasses. The symposium was sponsored by the American Physical Society and supported by a grant from GTE Laboratories. Additional support funds were provided by General Electric, Allied Chemical and Ford Motor Company. The program committee consisted of J.J. Becker (General Electric), P.A. Casabella (RPI), P.J. Cote (Watervliet Arsenal), A.M. de Graaf (Wayne State University), R. Hasegawa, Co-Chairman (Allied Chemical), H.O. Hooper (University of Maine), H.B. Huntington (RPI), R.A. Levy, Chairman (RPI), R.K. MacCrone (RPI), L.N. Mulay (Penn State University), G.L. Salinger (RPI) and J. Wong (General Electric). The program of the symposium included 7 invited review papers, 53 contributed papers, and 10 additional papers read by title because of time limitations. The editors wish to extend their deep appreciation to J.J. Becker, A.M. de Graaf, P. Duwez, J. Gustafson, D.L. Huber, U
Reduced thermal processing for ULSI by Roland A Levy( Book )

12 editions published between 1989 and 1990 in English and held by 154 WorldCat member libraries worldwide

As feature dimensions of integrated circuits shrink, the associated geometrical constraints on junction depth impose severe restrictions on the thermal budget for processing such devices. Furthermore, due to the relatively low melting point of the first aluminum metallization level, such restrictions extend to the fabrication of multilevel structures that are now essential in increasing packing density of interconnect lines. The fabrication of ultra large scale integrated (ULSI) devices under thermal budget restrictions requires the reassessment of existing and the development of new microelectronic materials and processes. This book addresses three broad but interrelated areas. The first area focuses on the subject of rapid thermal processing (RTP), a technology that allows minimization of processing time while relaxing the constraints on high temperature. Initially developed to limit dopant redistribution, current applications of RTP are shown here to encompass annealing, oxidation, nitridation, silicidation, glass reflow, and contact sintering. In a second but complementary area, advances in equipment design and performance of rapid thermal processing equipment are presented in conjunction with associated issues of temperature measurement and control. Defect mechanisms are assessed together with the resulting properties of rapidly deposited and processed films. The concept of RTP integration for a full CMOS device process is also examined together with its impact on device characteristics
Microelectronic materials and processes : [proceedings of the NATO Aadvanced Study Institute on Microelectronic Materials and Processes, Il Ciocco, Castelvecchio Pascoli, Italy, June 30-July 11, 1986] by Roland A Levy( Book )

13 editions published between 1986 and 1989 in English and Undetermined and held by 142 WorldCat member libraries worldwide

The primary thrust of very large scale integration (VLS!) is the miniaturization of devices to increase packing density, achieve higher speed, and consume lower power. The fabrication of integrated circuits containing in excess of four million components per chip with design rules in the submicron range has now been made possible by the introduction of innovative circuit designs and the development of new microelectronic materials and processes. This book addresses the latter challenge by assessing the current status of the science and technology associated with the production of VLSI silicon circuits. It represents the cumulative effort of experts from academia and industry who have come together to blend their expertise into a tutorial overview and cohesive update of this rapidly expanding field. A balance of fundamental and applied contributions cover the basics of microelectronics materials and process engineering. Subjects in materials science include silicon, silicides, resists, dielectrics, and interconnect metallization. Subjects in process engineering include crystal growth, epitaxy, oxidation, thin film deposition, fine-line lithography, dry etching, ion implantation, and diffusion. Other related topics such as process simulation, defects phenomena, and diagnostic techniques are also included. This book is the result of a NATO-sponsored Advanced Study Institute (AS!) held in Castelvecchio Pascoli, Italy. Invited speakers at this institute provided manuscripts which were edited, updated, and integrated with other contributions solicited from non-participants to this AS!
Novel silicon based technologies by Roland A Levy( Book )

12 editions published in 1991 in English and held by 132 WorldCat member libraries worldwide

Silicon, as an electronic substrate, has sparked a technological revolution that has allowed the realization of very large scale integration (VLSI) of circuits on a chip. These 6 fingernail-sized chips currently carry more than 10 components, consume low power, cost a few dollars, and are capable of performing data processing, numerical computations, and signal conditioning tasks at gigabit-per-second rates. Silicon, as a mechanical substrate, promises to spark another technological revolution that will allow computer chips to come with the eyes, ears, and even hands needed for closed-loop control systems. The silicon VLSI process technology which has been perfected over three decades can now be extended towards the production of novel structures such as epitaxially grown optoelectronic GaAs devices, buried layers for three dimensional integration, micromechanical mechanisms, integrated photonic circuits, and artificial neural networks. This book begins by addressing the processing of electronic and optoelectronic devices produced by using lattice mismatched epitaxial GaAs films on Si. Two viable technologies are considered. In one, silicon is used as a passive substrate in order to take advantage of its favorable properties over bulk GaAs; in the other, GaAs and Si are combined on the same chip in order to develop IC configurations with improved performance and increased levels of integration. The relationships between device operation and substrate quality are discussed in light of potential electronic and optoelectronic applications
L'optique non linéaire et ses matériaux : Ecole thématique, Agelonde - Complexe résidentiel de France Télécom, La londe les Maures (Var), du 29 juin au 11 juillet 1998 by Jean-Michel Jonathan( Book )

9 editions published between 2000 and 2007 in French and held by 66 WorldCat member libraries worldwide

Thanks to the development of laser beams, we now know that the intensity of light is susceptible to modifying the optical properties of matter. Nonlinear optics permit interaction of light beams through the intermediary of the fields they cross. From fundamental basics to applied sciences, this work gives an invaluable overview of the diversity of the aspects of matter and function
6èmes Journées d'études sur l'optique dans l'ordinateur : colloque by Journées d'Etudes sur l'Optique dans l'Ordinateur( Book )

6 editions published in 1991 in 3 languages and held by 58 WorldCat member libraries worldwide

Sixième colloque sur les lasers et l'optique quantique : COLOQ 6, ENSERB, Université Bordeaux I, Talence, France, 7-9 septembre 1999 by Colloque sur les lasers et l'optique quantique( Book )

2 editions published in 2000 in French and held by 33 WorldCat member libraries worldwide

Cinquième colloque sur les lasers et l'optique quantique : COLOQ 5, Université Louis Pasteur de Strasbourg, 8, 9, 10 septembre 1997 by 1997, Strasbourg) COLOQ (5( Book )

5 editions published in 1998 in French and held by 31 WorldCat member libraries worldwide

Materials and processes for submicron technologies : proceedings of Symposium N on Materials and Processes for Submicron Technologies of the E-MRS Spring Conference, Strasbourg, France, 16-19 June 1998 by Symposium Materials and Processes for Submicron Technologies( Book )

3 editions published in 1999 in English and held by 26 WorldCat member libraries worldwide

Histoire de la musique( Book )

in French and held by 3 WorldCat member libraries worldwide

Amorphous magnetism( Book )

1 edition published in 1977 in Undetermined and held by 3 WorldCat member libraries worldwide

Proceedings of the second International Symposium on Amorphous Magnetism : [held at Rensselaer Polytechnic Institute, Troy, New York, August 25 - 27, 1976] by International Symposium on Amorphous Magnetism( Book )

1 edition published in 1977 in English and held by 2 WorldCat member libraries worldwide

Magnetizm amorfnyh sistem( Book )

1 edition published in 1981 in Russian and held by 1 WorldCat member library worldwide

Reduced thermal processing for ULSI : Advanced study institute : Papers( )

1 edition published in 1989 in English and held by 1 WorldCat member library worldwide

Reduced Thermal Processing for ULSI by Roland A Levy( )

1 edition published in 1989 in English and held by 1 WorldCat member library worldwide

Mössbauer study of ferromagnetic phase transitions of dilute iron in palladium-silver alloys by Roland A Levy( )

1 edition published in 1973 in English and held by 1 WorldCat member library worldwide

Investigation of Chemically Vapor Deposited Tantalum for Medium Caliber Gun Barrel Protection( )

1 edition published in 2008 in English and held by 0 WorldCat member libraries worldwide

The overall objective of this SERDP-supported program (WP-1425) was to investigate the use of chemical vapor deposition (CVD) to produce high quality tantalum (Ta) coatings for wear and erosion protection of medium caliber gun barrels. In addition to offering an environmentally benign alternative to chromium (Cr) plating, this relatively low temperature process proved to provide high throughput, low cost, conformal step coverage, and coatings with desirable properties and performance
An integrated optical sensor for environmental monitoring by Roland A Levy( Book )

1 edition published in 1998 in English and held by 0 WorldCat member libraries worldwide

 
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Microelectronic materials and processes : [proceedings of the NATO Aadvanced Study Institute on Microelectronic Materials and Processes, Il Ciocco, Castelvecchio Pascoli, Italy, June 30-July 11, 1986]
Alternative Names
Levy, R.

Levy, R. A.

Levy, R. A. 1944-

Levy, R. A. (Roland Albert), 1944-

Levy, Roland Albert 1944-

Languages
English (60)

French (19)

Russian (1)

Italian (1)

Covers
Microelectronic materials and processes : [proceedings of the NATO Aadvanced Study Institute on Microelectronic Materials and Processes, Il Ciocco, Castelvecchio Pascoli, Italy, June 30-July 11, 1986]Novel silicon based technologiesMaterials and processes for submicron technologies : proceedings of Symposium N on Materials and Processes for Submicron Technologies of the E-MRS Spring Conference, Strasbourg, France, 16-19 June 1998