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  E-mail Message: I thought you might be interested in this item at http://www.worldcat.org/oclc/49844130 Title: Advances in low temperature rf plasmas : basis for process design Author: T Makabe Publisher: Amsterdam ; Boston : Elsevier, 2002. ISBN/ISSN: 0444510958 9780444510952 OCLC:49844130

  
  

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Subjects

• Low temperature plasmas -- Industrial applications.

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Advances in low temperature rf plasmas : basis for process design