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19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California

Author: Frank E Abboud; Brian J Grenon; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers.; SPIE Digital Library.
Publisher: Bellingham, Wash., USA : SPIE, ©1999.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 3873.
Edition/Format:   eBook : Document : Conference publication : EnglishView all editions and formats
Summary:

These 100 papers, presented at the 19th Annual BACUS Symposium on Photomask Technology and Management, offer information on advances in all areas of the field.

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Genre/Form: Conference papers and proceedings
Congresses
Additional Physical Format: (DLC) 2001274557
(OCoLC)43381540
Material Type: Conference publication, Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: Frank E Abboud; Brian J Grenon; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers.; SPIE Digital Library.
ISBN: 081943468X 9780819434685
OCLC Number: 53835925
Notes: Eighteenth conference called: Symposium on Photomask Technology and Management.
Reproduction Notes: Electronic reproduction. Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 2003. Mode of access: World Wide Web. Access restricted to SPIE Digital Library subscribers.
Description: 2 volumes (xv, 1022 pages) : illustrations (some color) ; 28 cm.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 3873.
Other Titles: Nineteenth Annual Symposium on Photomask Technology
Symposium on Photomask Technology
Photomask technology
Responsibility: Frank E. Abboud, Brian J. Grenon, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology.

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Primary Entity

<http://www.worldcat.org/oclc/53835925> # 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
    a schema:Book, schema:CreativeWork, schema:MediaObject ;
   library:oclcnum "53835925" ;
   library:placeOfPublication <http://experiment.worldcat.org/entity/work/data/13000728#Place/bellingham_wash_usa> ; # Bellingham, Wash., USA
   library:placeOfPublication <http://id.loc.gov/vocabulary/countries/wau> ;
   schema:about <http://id.worldcat.org/fast/1019883> ; # Microlithography
   schema:about <http://id.worldcat.org/fast/975575> ; # Integrated circuits--Masks
   schema:about <http://experiment.worldcat.org/entity/work/data/13000728#Topic/integrated_circuits_masks> ; # Integrated circuits--Masks
   schema:about <http://dewey.info/class/621.381531/e21/> ;
   schema:about <http://experiment.worldcat.org/entity/work/data/13000728#Topic/microlithography> ; # Microlithography
   schema:alternateName "Symposium on Photomask Technology" ;
   schema:alternateName "Nineteenth Annual Symposium on Photomask Technology" ;
   schema:alternateName "Photomask technology" ;
   schema:bookFormat schema:EBook ;
   schema:contributor <http://viaf.org/viaf/312841713> ; # BACUS (Technical group)
   schema:contributor <http://viaf.org/viaf/151856603> ; # Society of Photo-optical Instrumentation Engineers.
   schema:contributor <http://viaf.org/viaf/269189458> ; # Frank E. Abboud
   schema:contributor <http://viaf.org/viaf/271138402> ; # Brian J. Grenon
   schema:contributor <http://experiment.worldcat.org/entity/work/data/13000728#Organization/spie_digital_library> ; # SPIE Digital Library.
   schema:copyrightYear "1999" ;
   schema:creator <http://experiment.worldcat.org/entity/work/data/13000728#Meeting/symposium_on_photomask_technology_19th_1999_monterey_calif> ; # Symposium on Photomask Technology (19th : 1999 : Monterey, Calif.)
   schema:datePublished "1999" ;
   schema:exampleOfWork <http://worldcat.org/entity/work/id/13000728> ;
   schema:genre "Conference papers and proceedings"@en ;
   schema:genre "Conference publication"@en ;
   schema:inLanguage "en" ;
   schema:isPartOf <http://experiment.worldcat.org/entity/work/data/13000728#Series/proceedings_of_spie_the_international_society_for_optical_engineering> ; # Proceedings of SPIE--the International Society for Optical Engineering ;
   schema:isPartOf <http://experiment.worldcat.org/entity/work/data/13000728#Series/spie_proceedings_series> ; # SPIE proceedings series ;
   schema:isSimilarTo <http://www.worldcat.org/oclc/43381540> ;
   schema:name "19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California"@en ;
   schema:productID "53835925" ;
   schema:publication <http://www.worldcat.org/title/-/oclc/53835925#PublicationEvent/bellingham_wash_usa_spie_1999> ;
   schema:publisher <http://experiment.worldcat.org/entity/work/data/13000728#Agent/spie> ; # SPIE
   schema:url <http://link.spie.org/PSISDG/3873/1> ;
   schema:url <http://proceedings.spiedigitallibrary.org/volume.aspx?volume=3873> ;
   schema:workExample <http://worldcat.org/isbn/9780819434685> ;
   wdrs:describedby <http://www.worldcat.org/title/-/oclc/53835925> ;
    .


Related Entities

<http://experiment.worldcat.org/entity/work/data/13000728#Meeting/symposium_on_photomask_technology_19th_1999_monterey_calif> # Symposium on Photomask Technology (19th : 1999 : Monterey, Calif.)
    a bgn:Meeting, schema:Event ;
   schema:location <http://experiment.worldcat.org/entity/work/data/13000728#Place/monterey_calif> ; # Monterey, Calif.)
   schema:name "Symposium on Photomask Technology (19th : 1999 : Monterey, Calif.)" ;
    .

<http://experiment.worldcat.org/entity/work/data/13000728#Place/bellingham_wash_usa> # Bellingham, Wash., USA
    a schema:Place ;
   schema:name "Bellingham, Wash., USA" ;
    .

<http://experiment.worldcat.org/entity/work/data/13000728#Place/monterey_calif> # Monterey, Calif.)
    a schema:Place ;
   schema:name "Monterey, Calif.)" ;
    .

<http://experiment.worldcat.org/entity/work/data/13000728#Series/proceedings_of_spie_the_international_society_for_optical_engineering> # Proceedings of SPIE--the International Society for Optical Engineering ;
    a bgn:PublicationSeries ;
   schema:hasPart <http://www.worldcat.org/oclc/53835925> ; # 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
   schema:name "Proceedings of SPIE--the International Society for Optical Engineering ;" ;
    .

<http://experiment.worldcat.org/entity/work/data/13000728#Series/spie_proceedings_series> # SPIE proceedings series ;
    a bgn:PublicationSeries ;
   schema:hasPart <http://www.worldcat.org/oclc/53835925> ; # 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
   schema:name "SPIE proceedings series ;" ;
    .

<http://id.worldcat.org/fast/1019883> # Microlithography
    a schema:Intangible ;
   schema:name "Microlithography"@en ;
    .

<http://id.worldcat.org/fast/975575> # Integrated circuits--Masks
    a schema:Intangible ;
   schema:name "Integrated circuits--Masks"@en ;
    .

<http://viaf.org/viaf/151856603> # Society of Photo-optical Instrumentation Engineers.
    a schema:Organization ;
   schema:name "Society of Photo-optical Instrumentation Engineers." ;
    .

<http://viaf.org/viaf/269189458> # Frank E. Abboud
    a schema:Person ;
   schema:familyName "Abboud" ;
   schema:givenName "Frank E." ;
   schema:name "Frank E. Abboud" ;
    .

<http://viaf.org/viaf/271138402> # Brian J. Grenon
    a schema:Person ;
   schema:familyName "Grenon" ;
   schema:givenName "Brian J." ;
   schema:name "Brian J. Grenon" ;
    .

<http://viaf.org/viaf/312841713> # BACUS (Technical group)
    a schema:Organization ;
   schema:name "BACUS (Technical group)" ;
    .

<http://worldcat.org/isbn/9780819434685>
    a schema:ProductModel ;
   schema:isbn "081943468X" ;
   schema:isbn "9780819434685" ;
    .

<http://www.worldcat.org/oclc/43381540>
    a schema:CreativeWork ;
   schema:isSimilarTo <http://www.worldcat.org/oclc/53835925> ; # 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
    .

<http://www.worldcat.org/title/-/oclc/53835925>
    a genont:InformationResource, genont:ContentTypeGenericResource ;
   schema:about <http://www.worldcat.org/oclc/53835925> ; # 19th Annual Symposium on Photomask Technology : 15-17 September 1999, Monterey, California
   schema:dateModified "2017-12-25" ;
   void:inDataset <http://purl.oclc.org/dataset/WorldCat> ;
    .


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