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2001 6th International Symposium on Plasma- and Process-Induced Damage : May 13-15, 2001, Monterey, California, USA

Author: Manfred EngelhardtTerence HookCalvin T GabrielAmerican Vacuum Society.IEEE Electron Devices Society.All authors
Publisher: Santa Clara, Calif. : Northern California Chapter of the American Vacuum Society, ©2001.
Edition/Format:   Print book : Conference publication : EnglishView all editions and formats
Summary:

This work covers topics such as: damage measurement; plasma characterization and damage mitigation; non-volatile memories; ultra-thin dielectrics; contamination; and multi-terminal effects.

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Genre/Form: Conference papers and proceedings
Congresses
Material Type: Conference publication, Internet resource
Document Type: Book, Internet Resource
All Authors / Contributors: Manfred Engelhardt; Terence Hook; Calvin T Gabriel; American Vacuum Society.; IEEE Electron Devices Society.; Ōyō Butsuri Gakkai.
ISBN: 096515775X 9780965157759 0965157768 9780965157766
OCLC Number: 47163463
Notes: Previous Symposium entitled: International Symposium on Plasma Induced-Damage.
"IEEE Catalog Number (softbound) 01TH8538 ; IEEE Catalog Number (CD-ROM) 01TH8538C"--Title page verso.
Description: [5], i, 128 pages : illustrations ; 28 cm
Contents: [V. 1] Intraindividual processes / edited by Abraham Tesser and Norbert Schwarz --
[v. 2] Interpersonal processes / edited by Garth J.O. Fletcher and Margaret S. Clark --
[v. 3] Group processes / edited by Michael A. Hogg and R. Scott Tindale --
[v. 4] Intergroup processes / edited by Rupert Brown and Samuel L. Gaertner.
Other Titles: P²ID
Plasma- and process-induced damage
Plasma process induced-damage
Responsibility: Manfred Englehardt, Terence Hook, and and Calvin T. Gabriel, editors ; technical co-sponsors, American Vacuum Society, IEEE/Electron devices Society, Japanese Society of Applied Physics.

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