skip to content
23rd Annual BACUS Symposium on Photomask Technology : 9-12 September, 2003, Monterey, California, USA Preview this item
ClosePreview this item
Checking...

23rd Annual BACUS Symposium on Photomask Technology : 9-12 September, 2003, Monterey, California, USA

Author: Kurt R Kimmel; Wolfgang Staud; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers.; SPIE Digital Library.
Publisher: Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©2003.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 5256.
Edition/Format:   eBook : Document : Conference publication : EnglishView all editions and formats
Database:WorldCat
Rating:

(not yet rated) 0 with reviews - Be the first.

Subjects
More like this

 

Find a copy online

Links to this item

Find a copy in the library

&AllPage.SpinnerRetrieving; Finding libraries that hold this item...

Details

Genre/Form: Conference papers and proceedings
Congresses
Additional Physical Format: (OCoLC)53993726
Material Type: Conference publication, Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: Kurt R Kimmel; Wolfgang Staud; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers.; SPIE Digital Library.
OCLC Number: 54050369
Reproduction Notes: Electronic reproduction. Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 2003. Mode of access: World Wide Web. Access restricted to SPIE Digital Library subscribers.
Description: 2 volumes (xix, 1362 pages) : illustrations (some color) ; 28 cm.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 5256.
Other Titles: Twenty-third Annual BACUS Symposium on Photomask Technology
Annual BACUS Symposium on Photomask Technology
BACUS Symposium on Photomask Technology
Symposium on Photomask Technology
Photomask technology
Symposium on Photomask Technology and Management
Responsibility: Kurt R. Kimmel, Wolfgang Staud, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering.

Reviews

User-contributed reviews
Retrieving GoodReads reviews...
Retrieving DOGObooks reviews...

Tags

Be the first.
Confirm this request

You may have already requested this item. Please select Ok if you would like to proceed with this request anyway.

Linked Data


Primary Entity

<http://www.worldcat.org/oclc/54050369> # 23rd Annual BACUS Symposium on Photomask Technology : 9-12 September, 2003, Monterey, California, USA
    a schema:CreativeWork, schema:MediaObject, schema:Book ;
    library:oclcnum "54050369" ;
    library:placeOfPublication <http://id.loc.gov/vocabulary/countries/wau> ;
    library:placeOfPublication <http://experiment.worldcat.org/entity/work/data/3859411542#Place/bellingham_wash> ; # Bellingham, Wash.
    schema:about <http://id.worldcat.org/fast/975575> ; # Integrated circuits--Masks
    schema:about <http://id.worldcat.org/fast/1019883> ; # Microlithography
    schema:about <http://experiment.worldcat.org/entity/work/data/3859411542#Topic/microlithography> ; # Microlithography
    schema:about <http://experiment.worldcat.org/entity/work/data/3859411542#Topic/integrated_circuits_masks> ; # Integrated circuits--Masks
    schema:alternateName "Annual BACUS Symposium on Photomask Technology" ;
    schema:alternateName "BACUS Symposium on Photomask Technology" ;
    schema:alternateName "Symposium on Photomask Technology" ;
    schema:alternateName "Twenty-third Annual BACUS Symposium on Photomask Technology" ;
    schema:alternateName "Photomask technology" ;
    schema:alternateName "Symposium on Photomask Technology and Management" ;
    schema:bookFormat schema:EBook ;
    schema:contributor <http://viaf.org/viaf/312841713> ; # BACUS (Technical group)
    schema:contributor <http://experiment.worldcat.org/entity/work/data/3859411542#Organization/spie_digital_library> ; # SPIE Digital Library.
    schema:contributor <http://viaf.org/viaf/278072172> ; # Wolfgang Staud
    schema:contributor <http://viaf.org/viaf/91173864> ; # Kurt Rudolf Kimmel
    schema:contributor <http://viaf.org/viaf/127619765> ; # Society of Photo-optical Instrumentation Engineers.
    schema:copyrightYear "2003" ;
    schema:creator <http://experiment.worldcat.org/entity/work/data/3859411542#Meeting/bacus_symposium_on_photomask_technology_23rd_2003_monterey_calif> ; # BACUS Symposium on Photomask Technology (23rd : 2003 : Monterey, Calif.)
    schema:datePublished "2003" ;
    schema:exampleOfWork <http://worldcat.org/entity/work/id/3859411542> ;
    schema:genre "Conference publication"@en ;
    schema:genre "Conference papers and proceedings"@en ;
    schema:inLanguage "en" ;
    schema:isPartOf <http://worldcat.org/issn/0277-786X> ; # SPIE proceedings series,
    schema:isPartOf <http://experiment.worldcat.org/entity/work/data/3859411542#Series/proceedings_of_spie_the_international_society_for_optical_engineering> ; # Proceedings of SPIE--the International Society for Optical Engineering ;
    schema:isSimilarTo <http://www.worldcat.org/oclc/53993726> ;
    schema:name "23rd Annual BACUS Symposium on Photomask Technology : 9-12 September, 2003, Monterey, California, USA"@en ;
    schema:productID "54050369" ;
    schema:publication <http://www.worldcat.org/title/-/oclc/54050369#PublicationEvent/bellingham_wash_society_of_photo_optical_instrumentation_engineers_2003> ;
    schema:publisher <http://experiment.worldcat.org/entity/work/data/3859411542#Agent/society_of_photo_optical_instrumentation_engineers> ; # Society of Photo-optical Instrumentation Engineers
    schema:url <http://link.spie.org/PSISDG/5256/1> ;
    wdrs:describedby <http://www.worldcat.org/title/-/oclc/54050369> ;
    .


Related Entities

<http://experiment.worldcat.org/entity/work/data/3859411542#Agent/society_of_photo_optical_instrumentation_engineers> # Society of Photo-optical Instrumentation Engineers
    a bgn:Agent ;
    schema:name "Society of Photo-optical Instrumentation Engineers" ;
    .

<http://experiment.worldcat.org/entity/work/data/3859411542#Meeting/bacus_symposium_on_photomask_technology_23rd_2003_monterey_calif> # BACUS Symposium on Photomask Technology (23rd : 2003 : Monterey, Calif.)
    a bgn:Meeting, schema:Event ;
    schema:location <http://experiment.worldcat.org/entity/work/data/3859411542#Place/monterey_calif> ; # Monterey, Calif.)
    schema:name "BACUS Symposium on Photomask Technology (23rd : 2003 : Monterey, Calif.)" ;
    .

<http://experiment.worldcat.org/entity/work/data/3859411542#Organization/spie_digital_library> # SPIE Digital Library.
    a schema:Organization ;
    schema:name "SPIE Digital Library." ;
    .

<http://experiment.worldcat.org/entity/work/data/3859411542#Place/bellingham_wash> # Bellingham, Wash.
    a schema:Place ;
    schema:name "Bellingham, Wash." ;
    .

<http://experiment.worldcat.org/entity/work/data/3859411542#Place/monterey_calif> # Monterey, Calif.)
    a schema:Place ;
    schema:name "Monterey, Calif.)" ;
    .

<http://experiment.worldcat.org/entity/work/data/3859411542#Series/proceedings_of_spie_the_international_society_for_optical_engineering> # Proceedings of SPIE--the International Society for Optical Engineering ;
    a bgn:PublicationSeries ;
    schema:hasPart <http://www.worldcat.org/oclc/54050369> ; # 23rd Annual BACUS Symposium on Photomask Technology : 9-12 September, 2003, Monterey, California, USA
    schema:name "Proceedings of SPIE--the International Society for Optical Engineering ;" ;
    .

<http://id.worldcat.org/fast/1019883> # Microlithography
    a schema:Intangible ;
    schema:name "Microlithography"@en ;
    .

<http://id.worldcat.org/fast/975575> # Integrated circuits--Masks
    a schema:Intangible ;
    schema:name "Integrated circuits--Masks"@en ;
    .

<http://viaf.org/viaf/127619765> # Society of Photo-optical Instrumentation Engineers.
    a schema:Organization ;
    schema:name "Society of Photo-optical Instrumentation Engineers." ;
    .

<http://viaf.org/viaf/278072172> # Wolfgang Staud
    a schema:Person ;
    schema:familyName "Staud" ;
    schema:givenName "Wolfgang" ;
    schema:name "Wolfgang Staud" ;
    .

<http://viaf.org/viaf/312841713> # BACUS (Technical group)
    a schema:Organization ;
    schema:name "BACUS (Technical group)" ;
    .

<http://viaf.org/viaf/91173864> # Kurt Rudolf Kimmel
    a schema:Person ;
    schema:familyName "Kimmel" ;
    schema:givenName "Kurt Rudolf" ;
    schema:givenName "Kurt R." ;
    schema:name "Kurt Rudolf Kimmel" ;
    .

<http://worldcat.org/issn/0277-786X> # SPIE proceedings series,
    a bgn:PublicationSeries ;
    schema:hasPart <http://www.worldcat.org/oclc/54050369> ; # 23rd Annual BACUS Symposium on Photomask Technology : 9-12 September, 2003, Monterey, California, USA
    schema:issn "0277-786X" ;
    schema:name "SPIE proceedings series," ;
    .

<http://www.worldcat.org/oclc/53993726>
    a schema:CreativeWork ;
    schema:isSimilarTo <http://www.worldcat.org/oclc/54050369> ; # 23rd Annual BACUS Symposium on Photomask Technology : 9-12 September, 2003, Monterey, California, USA
    .

<http://www.worldcat.org/title/-/oclc/54050369>
    a genont:InformationResource, genont:ContentTypeGenericResource ;
    schema:about <http://www.worldcat.org/oclc/54050369> ; # 23rd Annual BACUS Symposium on Photomask Technology : 9-12 September, 2003, Monterey, California, USA
    schema:dateModified "2016-09-15" ;
    void:inDataset <http://purl.oclc.org/dataset/WorldCat> ;
    .


Content-negotiable representations

Close Window

Please sign in to WorldCat 

Don't have an account? You can easily create a free account.