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23rd Annual BACUS Symposium on Photomask Technology : 9-12 September, 2003, Monterey, California, USA

Author: Kurt R Kimmel; Wolfgang Staud; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers.; SPIE Digital Library.
Publisher: Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©2003.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 5256.
Edition/Format:   eBook : Document : Conference publication : EnglishView all editions and formats
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Genre/Form: Conference papers and proceedings
Congresses
Additional Physical Format: (OCoLC)53993726
Material Type: Conference publication, Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: Kurt R Kimmel; Wolfgang Staud; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers.; SPIE Digital Library.
ISBN: 0819451436 9780819451439
OCLC Number: 54050369
Reproduction Notes: Electronic reproduction. Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 2003. Mode of access: World Wide Web. Access restricted to SPIE Digital Library subscribers.
Description: 2 volumes (xix, 1362 pages) : illustrations (some color) ; 28 cm.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 5256.
Other Titles: Twenty-third Annual BACUS Symposium on Photomask Technology
Annual BACUS Symposium on Photomask Technology
BACUS Symposium on Photomask Technology
Symposium on Photomask Technology
Photomask technology
Symposium on Photomask Technology and Management
Responsibility: Kurt R. Kimmel, Wolfgang Staud, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering.

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