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25th Annual BACUS Symposium on Photomask Technology, 4-7 October, 2005, Monterey, California, USA

Author: J Tracy Weed; Patrick M Martin; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers.
Publisher: Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©2005.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 5992.
Edition/Format:   Print book : Conference publication : EnglishView all editions and formats
Database:WorldCat
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Genre/Form: Conference papers and proceedings
Congresses
Material Type: Conference publication
Document Type: Book
All Authors / Contributors: J Tracy Weed; Patrick M Martin; BACUS (Technical group); Society of Photo-optical Instrumentation Engineers.
ISBN: 0819460141 9780819460141
OCLC Number: 62762525
Description: 2 volumes : illustrations (some color) ; 28 cm.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 5992.
Other Titles: Annual BACUS Symposium on Photomask Technology
BACUS Symposium on Photomask Technology
Symposium on Photomask Technology
Photomask technology
Responsibility: J. Tracy Weed, Patrick M. Martin, chairs/editors ; sponsored by BACUS--the International Technical Group of SPIE dedicated to the advancement of photomask technology [and] SPIE--the International Society for Optical Engineering ; published by SPIE--the International Society for Optical Engineering.

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