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Advanced microlithography technologies : 8-10 November, 2004, Beijing, China

Author: Yangyuan WangJun'en YaoChristopher J ProglerSociety of Photo-optical Instrumentation Engineers.Zhongguo guang xue xue hui.All authors
Publisher: Bellingham, Wash. : SPIE, ©2005.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 5645.
Edition/Format:   Print book : Conference publication : EnglishView all editions and formats
Summary:

Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.

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Genre/Form: Conference papers and proceedings
Congresses
Additional Physical Format: Online version:
Advanced microlithography technologies.
Bellingham, Wash. : SPIE, ©2005
(OCoLC)607678301
Online version:
Advanced microlithography technologies.
Bellingham, Wash. : SPIE, ©2005
(OCoLC)608380155
Material Type: Conference publication, Internet resource
Document Type: Book, Internet Resource
All Authors / Contributors: Yangyuan Wang; Jun'en Yao; Christopher J Progler; Society of Photo-optical Instrumentation Engineers.; Zhongguo guang xue xue hui.; Australian Optical Society.; Guo jia zi ran ke xue ji jin wei yuan hui (China)
ISBN: 0819456004 9780819456007
OCLC Number: 58793964
Description: xi, 380 pages : illustrations ; 28 cm.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 5645.
Other Titles: Microlithography technologies
Responsibility: Yangyuan Wang, Jun-en Yao, Christopher J. Progler, chairs/editors ; sponsored by SPIE--the International Society for Optical Engineering, COS--Chinese Optical Society ; cooperating organizations, Australian Optical Society [and others] ; supporting organizations, National Natural Science Foundation of China [and others].

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