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Advances in resist technology and processing VIII : 4-5 March, 1991, San Jose, California

Author: Hiroshi Ito; Society of Photo-optical Instrumentation Engineers.
Publisher: Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1991.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 1466.
Edition/Format:   Print book : Conference publication : EnglishView all editions and formats
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Genre/Form: Conference papers and proceedings
Congresses
Material Type: Conference publication, Internet resource
Document Type: Book, Internet Resource
All Authors / Contributors: Hiroshi Ito; Society of Photo-optical Instrumentation Engineers.
ISBN: 0819405655 9780819405654
OCLC Number: 24150723
Description: xii, 679 pages : illustrations ; 28 cm.
Contents: Chemical amplification resist systems --
Diazonaphthoquinones and phenolic resins --
Silicon-containing resists and plasma/dry process --
Resist process, chracterization, and modeling --
Poster sesssion I: Chemical amplification resist systems --
Poster session II: Dissolution inhibition resist systems --
Poster session III: Silicon-containing resists and plasma/dry process --
Poster session IV: Lithographic processes.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 1466.
Other Titles: Resist technology and processing VIII
Responsibility: Hiroshi Ito, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.

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