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Advances in resist technology and processing XVII : 28 February-1 March, 2000, Santa Clara, USA

Author: Francis M Houlihan; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.
Publisher: Bellingham, Washington : Society of Photo-optical Instrumentation Engineers, ©2000.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 3999.
Edition/Format:   Print book : Conference publication : EnglishView all editions and formats
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Genre/Form: Conference papers and proceedings
Congresses
Material Type: Conference publication
Document Type: Book
All Authors / Contributors: Francis M Houlihan; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.
ISBN: 0819436178 9780819436177
OCLC Number: 44601328
Description: 2 volumes (xvii, 1252 pages) : illustrations ; 28 cm.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 3999.
Other Titles: Resist technology and processing XVII
Responsibility: Francis M. Houlihan, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.

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