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Advances in resist technology and processing XVII : 28 February-1 March, 2000, Santa Clara, USA

Author: Francis M Houlihan; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.; SPIE Digital Library.
Publisher: Bellingham, Wash. : SPIE, ©2000.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 3999.
Edition/Format:   eBook : Document : Conference publication : EnglishView all editions and formats
Database:WorldCat
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Genre/Form: Conference papers and proceedings
Congresses
Additional Physical Format: (OCoLC)44601328
Material Type: Conference publication, Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: Francis M Houlihan; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.; SPIE Digital Library.
OCLC Number: 53834704
Reproduction Notes: Electronic reproduction. Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 2003. Mode of access: World Wide Web. Access restricted to SPIE Digital Library subscribers.
Description: 2 volumes (xvii, 1252 pages) : illustrations ; 28 cm.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 3999.
Responsibility: Francis M. Houlihan, chair/editor ; sponsored by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.

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