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Advances in resist technology and processing XVIII : 26-28 February, 2001, Santa Clara, [California] USA

Author: Francis M Houlihan; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.; SPIE Digital Library.
Publisher: Bellingham, Wash. : SPIE, ©2001.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 4345.
Edition/Format:   eBook : Document : Conference publication : EnglishView all editions and formats
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Genre/Form: Conference papers and proceedings
Congresses
Additional Physical Format: (DLC) 2002283519
(OCoLC)48152924
Material Type: Conference publication, Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: Francis M Houlihan; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.; SPIE Digital Library.
ISBN: 0819440310 9780819440310
OCLC Number: 53835934
Reproduction Notes: Electronic reproduction. Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 2003. Mode of access: World Wide Web. Access restricted to SPIE Digital Library subscribers.
Description: 2 volumes (xxix, 1084 pages) : illustrations ; 28 cm.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 4345.
Responsibility: Francis M. Houlihan, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, International SEMATECH.

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