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Alternative lithographic technologies IV : 13-16 February 2012, San Jose, California, United States

Author: William Man-Wai Tong; Douglas J Resnick; SPIE (Society)
Publisher: Bellingham, Wash. : SPIE, ©2012.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 8323.
Edition/Format:   eBook : Document : Conference publication : EnglishView all editions and formats
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Genre/Form: Electronic books
Conference papers and proceedings
Congresses
Material Type: Conference publication, Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: William Man-Wai Tong; Douglas J Resnick; SPIE (Society)
OCLC Number: 790128556
Description: 1 online resource : illustrations (some color).
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 8323.
Other Titles: Alternative lithographic technologies 4
Alternative lithographic technologies four
Responsibility: William M. Tong, Douglas J. Resnick, editors ; sponsored ... by SPIE.

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Linked Data


Primary Entity

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   schema:about <http://experiment.worldcat.org/entity/work/data/1104445066#Topic/lithography_electron_beam> ; # Lithography, Electron beam
   schema:about <http://id.worldcat.org/fast/1011095> ; # Masks (Electronics)
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