skip to content
Alternative Lithographic Technologies VII : 23-26 February 2015, San Jose, California, United States Preview this item
ClosePreview this item
Checking...

Alternative Lithographic Technologies VII : 23-26 February 2015, San Jose, California, United States

Author: Douglas J Resnick; Christopher Bencher; SPIE (Society),
Publisher: Bellingham, Washington : SPIE, [2015]. ©2015
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 9423.
Edition/Format:   eBook : Document : Conference publication : EnglishView all editions and formats
Summary:
'Proceedings of SPIE' presents the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields.
Rating:

(not yet rated) 0 with reviews - Be the first.

Subjects
More like this

 

Find a copy online

Links to this item

Find a copy in the library

&AllPage.SpinnerRetrieving; Finding libraries that hold this item...

Details

Genre/Form: Conference papers and proceedings
Congresses
Additional Physical Format: Print version:
(OCoLC)915905730
Material Type: Conference publication, Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: Douglas J Resnick; Christopher Bencher; SPIE (Society),
OCLC Number: 907356004
Description: 1 online resource : illustrations (some color).
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 9423.
Other Titles: Alternative Lithographic Technologies 7
Alternative Lithographic Technologies seven
Responsibility: Douglas J. Resnick, Christopher Bencher, editors ; sponsored by SPIE ; cosponsored by DNS Electronics, LLC ; published by SPIE.

Abstract:

Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.  Read more...

Reviews

User-contributed reviews
Retrieving GoodReads reviews...
Retrieving DOGObooks reviews...

Tags

Be the first.
Confirm this request

You may have already requested this item. Please select Ok if you would like to proceed with this request anyway.

Linked Data


Primary Entity

<http://www.worldcat.org/oclc/907356004> # Alternative Lithographic Technologies VII : 23-26 February 2015, San Jose, California, United States
    a schema:MediaObject, schema:Book, schema:CreativeWork ;
   library:oclcnum "907356004" ;
   library:placeOfPublication <http://id.loc.gov/vocabulary/countries/wau> ;
   schema:about <http://experiment.worldcat.org/entity/work/data/2571756429#Topic/masks_electronics> ; # Masks (Electronics)
   schema:about <http://experiment.worldcat.org/entity/work/data/2571756429#Topic/lithography_electron_beam> ; # Lithography, Electron beam
   schema:about <http://dewey.info/class/621.381531/e23/> ;
   schema:about <http://experiment.worldcat.org/entity/work/data/2571756429#Topic/extreme_ultraviolet_lithography> ; # Extreme ultraviolet lithography
   schema:about <http://experiment.worldcat.org/entity/work/data/2571756429#Topic/microlithography_industrial_applications> ; # Microlithography--Industrial applications
   schema:alternateName "Alternative Lithographic Technologies 7" ;
   schema:alternateName "Alternative Lithographic Technologies seven" ;
   schema:bookFormat schema:EBook ;
   schema:contributor <http://experiment.worldcat.org/entity/work/data/2571756429#Organization/spie_society> ; # SPIE (Society),
   schema:copyrightYear "2015" ;
   schema:datePublished "2015" ;
   schema:description "'Proceedings of SPIE' presents the original research papers presented at SPIE conferences and other high-quality conferences in the broad-ranging fields of optics and photonics. These books provide prompt access to the latest innovations in research and technology in their respective fields."@en ;
   schema:editor <http://experiment.worldcat.org/entity/work/data/2571756429#Person/bencher_christopher> ; # Christopher Bencher
   schema:editor <http://experiment.worldcat.org/entity/work/data/2571756429#Person/resnick_douglas_j> ; # Douglas J. Resnick
   schema:exampleOfWork <http://worldcat.org/entity/work/id/2571756429> ;
   schema:genre "Conference publication"@en ;
   schema:genre "Conference papers and proceedings"@en ;
   schema:inLanguage "en" ;
   schema:isPartOf <http://worldcat.org/issn/0277-786X> ; # Proceedings of SPIE--the International Society for Optical Engineering ;
   schema:isSimilarTo <http://www.worldcat.org/oclc/915905730> ;
   schema:name "Alternative Lithographic Technologies VII : 23-26 February 2015, San Jose, California, United States"@en ;
   schema:productID "907356004" ;
   schema:url <http://proceedings.spiedigitallibrary.org/volume.aspx?volume=9423&issue=1> ;
   schema:url <http://proceedings.spiedigitallibrary.org/volume.aspx?volume=9423> ;
   wdrs:describedby <http://www.worldcat.org/title/-/oclc/907356004> ;
    .


Related Entities

<http://experiment.worldcat.org/entity/work/data/2571756429#Person/bencher_christopher> # Christopher Bencher
    a schema:Person ;
   schema:familyName "Bencher" ;
   schema:givenName "Christopher" ;
   schema:name "Christopher Bencher" ;
    .

<http://experiment.worldcat.org/entity/work/data/2571756429#Person/resnick_douglas_j> # Douglas J. Resnick
    a schema:Person ;
   schema:familyName "Resnick" ;
   schema:givenName "Douglas J." ;
   schema:name "Douglas J. Resnick" ;
    .

<http://experiment.worldcat.org/entity/work/data/2571756429#Topic/extreme_ultraviolet_lithography> # Extreme ultraviolet lithography
    a schema:Intangible ;
   schema:name "Extreme ultraviolet lithography"@en ;
    .

<http://experiment.worldcat.org/entity/work/data/2571756429#Topic/lithography_electron_beam> # Lithography, Electron beam
    a schema:Intangible ;
   schema:name "Lithography, Electron beam"@en ;
    .

<http://experiment.worldcat.org/entity/work/data/2571756429#Topic/masks_electronics> # Masks (Electronics)
    a schema:Intangible ;
   schema:name "Masks (Electronics)"@en ;
    .

<http://experiment.worldcat.org/entity/work/data/2571756429#Topic/microlithography_industrial_applications> # Microlithography--Industrial applications
    a schema:Intangible ;
   schema:name "Microlithography--Industrial applications"@en ;
    .

<http://worldcat.org/issn/0277-786X> # Proceedings of SPIE--the International Society for Optical Engineering ;
    a bgn:PublicationSeries ;
   schema:hasPart <http://www.worldcat.org/oclc/907356004> ; # Alternative Lithographic Technologies VII : 23-26 February 2015, San Jose, California, United States
   schema:issn "0277-786X" ;
   schema:name "Proceedings of SPIE--the International Society for Optical Engineering ;" ;
   schema:name "Proceedings of SPIE," ;
    .

<http://www.worldcat.org/oclc/915905730>
    a schema:CreativeWork ;
   schema:description "Print version:" ;
   schema:isSimilarTo <http://www.worldcat.org/oclc/907356004> ; # Alternative Lithographic Technologies VII : 23-26 February 2015, San Jose, California, United States
    .

<http://www.worldcat.org/title/-/oclc/907356004>
    a genont:InformationResource, genont:ContentTypeGenericResource ;
   schema:about <http://www.worldcat.org/oclc/907356004> ; # Alternative Lithographic Technologies VII : 23-26 February 2015, San Jose, California, United States
   schema:dateModified "2017-09-02" ;
   void:inDataset <http://purl.oclc.org/dataset/WorldCat> ;
    .


Content-negotiable representations

Close Window

Please sign in to WorldCat 

Don't have an account? You can easily create a free account.