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Basic vacuum technology

Author: A Chambers; R K Fitch; B S Halliday
Publisher: Bristol ; Philadelphia : Institute of Physics Pub., ©1998.
Edition/Format:   eBook : Document : English : 2nd edView all editions and formats
Summary:

Presents foundation of fundamental knowledge about vacuum techniques and the ability to apply it. This book provides a grounding in the basic scientific principles and concepts that underlie the  Read more...

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Genre/Form: Electronic books
Additional Physical Format: Print version:
Chambers, A.
Basic vacuum technology.
Bristol ; Philadelphia : Institute of Physics Pub., ©1998
(DLC) 98020304
(OCoLC)39045126
Material Type: Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: A Chambers; R K Fitch; B S Halliday
ISBN: 0585254915 9780585254913 9780750304955 0750304952
OCLC Number: 45727687
Description: 1 online resource (xiv, 189 pages) : illustrations
Contents: 1. Gases / A. Chambers --
2. Gases in vacuum systems / A. Chambers --
3. Pumps / B.S. Halliday --
4. Measurement of pressure / R.K. Fitch and A. Chambers --
5. Vacuum materials and components / B.S. Halliday --
6. Cleaning / B.S. Halliday --
7. Leaks and leak detection / R.K. Fitch and B.S. Halliday --
8. Systems / B.S. Halliday --
App. A. Maximum evaporation rate from a surface --
App. B. Molecular drag --
App. C. Reynolds' number Re expressed in terms of throughput Q --
App. D. The Knudsen cosine law --
App. E.A derivation of the Knudsen formula for molecular flow through a pipe (equation (2.20)) --
App. F. Analysis of a simple system --
App. G. Systems with distributed volume --
App. H. Specifying and measuring flow --
App. I. The maintenance of vacuum equipment.
Responsibility: A. Chambers, R.K. Fitch, and B.S. Halliday.

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..." a very useful text which is an up to date introduction appropriate to new research students so that they can approach UHV equipmment with confidence." D K Ross, Director, Science Research Read more...

 
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Primary Entity

<http://www.worldcat.org/oclc/45727687> # Basic vacuum technology
    a schema:Book, schema:CreativeWork, schema:MediaObject ;
    library:oclcnum "45727687" ;
    library:placeOfPublication <http://id.loc.gov/vocabulary/countries/enk> ;
    library:placeOfPublication <http://experiment.worldcat.org/entity/work/data/1041482#Place/philadelphia> ; # Philadelphia
    library:placeOfPublication <http://experiment.worldcat.org/entity/work/data/1041482#Place/bristol> ; # Bristol
    schema:about <http://id.worldcat.org/fast/1163626> ; # Vacuum technology
    schema:about <http://dewey.info/class/621.55/e21/> ;
    schema:about <http://experiment.worldcat.org/entity/work/data/1041482#Topic/vide_technologie> ; # Vide (Technologie)
    schema:about <http://experiment.worldcat.org/entity/work/data/1041482#Topic/technology_&_engineering_mechanical> ; # TECHNOLOGY & ENGINEERING--Mechanical
    schema:bookEdition "2nd ed." ;
    schema:bookFormat schema:EBook ;
    schema:contributor <http://viaf.org/viaf/72947469> ; # B. S. Halliday
    schema:contributor <http://viaf.org/viaf/53275152> ; # R. K. Fitch
    schema:copyrightYear "1998" ;
    schema:creator <http://viaf.org/viaf/166629310> ; # A. Chambers
    schema:datePublished "1998" ;
    schema:description "1. Gases / A. Chambers -- 2. Gases in vacuum systems / A. Chambers -- 3. Pumps / B.S. Halliday -- 4. Measurement of pressure / R.K. Fitch and A. Chambers -- 5. Vacuum materials and components / B.S. Halliday -- 6. Cleaning / B.S. Halliday -- 7. Leaks and leak detection / R.K. Fitch and B.S. Halliday -- 8. Systems / B.S. Halliday -- App. A. Maximum evaporation rate from a surface -- App. B. Molecular drag -- App. C. Reynolds' number Re expressed in terms of throughput Q -- App. D. The Knudsen cosine law -- App. E.A derivation of the Knudsen formula for molecular flow through a pipe (equation (2.20)) -- App. F. Analysis of a simple system -- App. G. Systems with distributed volume -- App. H. Specifying and measuring flow -- App. I. The maintenance of vacuum equipment."@en ;
    schema:exampleOfWork <http://worldcat.org/entity/work/id/1041482> ;
    schema:genre "Electronic books"@en ;
    schema:inLanguage "en" ;
    schema:isSimilarTo <http://www.worldcat.org/oclc/39045126> ;
    schema:name "Basic vacuum technology"@en ;
    schema:productID "45727687" ;
    schema:publication <http://www.worldcat.org/title/-/oclc/45727687#PublicationEvent/bristol_philadelphia_institute_of_physics_pub_1998> ;
    schema:publisher <http://experiment.worldcat.org/entity/work/data/1041482#Agent/institute_of_physics_pub> ; # Institute of Physics Pub.
    schema:url <http://www.crcnetbase.com/isbn/9780750304955> ;
    schema:url <http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&AN=33682> ;
    schema:url <http://www.netlibrary.com/urlapi.asp?action=summary&v=1&bookid=33682> ;
    schema:url <https://www.taylorfrancis.com/books/9780585254913> ;
    schema:url <http://www.taylorfrancis.com/books/9780585254913> ;
    schema:url <http://www.crcnetbase.com/isbn/9780585254913> ;
    schema:url <http://uiwtx.idm.oclc.org/login?url=http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=33682> ;
    schema:url <http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=33682> ;
    schema:workExample <http://worldcat.org/isbn/9780585254913> ;
    schema:workExample <http://worldcat.org/isbn/9780750304955> ;
    wdrs:describedby <http://www.worldcat.org/title/-/oclc/45727687> ;
    .


Related Entities

<http://experiment.worldcat.org/entity/work/data/1041482#Agent/institute_of_physics_pub> # Institute of Physics Pub.
    a bgn:Agent ;
    schema:name "Institute of Physics Pub." ;
    .

<http://experiment.worldcat.org/entity/work/data/1041482#Topic/technology_&_engineering_mechanical> # TECHNOLOGY & ENGINEERING--Mechanical
    a schema:Intangible ;
    schema:name "TECHNOLOGY & ENGINEERING--Mechanical"@en ;
    .

<http://experiment.worldcat.org/entity/work/data/1041482#Topic/vide_technologie> # Vide (Technologie)
    a schema:Intangible ;
    schema:name "Vide (Technologie)"@en ;
    schema:name "Vide (Technologie)"@fr ;
    .

<http://id.worldcat.org/fast/1163626> # Vacuum technology
    a schema:Intangible ;
    schema:name "Vacuum technology"@en ;
    .

<http://viaf.org/viaf/166629310> # A. Chambers
    a schema:Person ;
    schema:familyName "Chambers" ;
    schema:givenName "A." ;
    schema:name "A. Chambers" ;
    .

<http://viaf.org/viaf/53275152> # R. K. Fitch
    a schema:Person ;
    schema:familyName "Fitch" ;
    schema:givenName "R. K." ;
    schema:name "R. K. Fitch" ;
    .

<http://viaf.org/viaf/72947469> # B. S. Halliday
    a schema:Person ;
    schema:familyName "Halliday" ;
    schema:givenName "B. S." ;
    schema:name "B. S. Halliday" ;
    .

<http://worldcat.org/isbn/9780585254913>
    a schema:ProductModel ;
    schema:isbn "0585254915" ;
    schema:isbn "9780585254913" ;
    .

<http://worldcat.org/isbn/9780750304955>
    a schema:ProductModel ;
    schema:isbn "0750304952" ;
    schema:isbn "9780750304955" ;
    .

<http://www.worldcat.org/oclc/39045126>
    a schema:CreativeWork ;
    rdfs:label "Basic vacuum technology." ;
    schema:description "Print version:" ;
    schema:isSimilarTo <http://www.worldcat.org/oclc/45727687> ; # Basic vacuum technology
    .

<https://www.taylorfrancis.com/books/9780585254913>
    rdfs:comment "from Taylor & Francis" ;
    .


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