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Characterization and metrology for ULSI technology 2000 : International Conference, Gaithersburg, Maryland, 26-29, June 2000

Author: David G Seiler
Publisher: Melville, N.Y. : American Institute of Physics, ©2000.
Series: AIP conference proceedings, no. 550.
Edition/Format:   eBook : Document : Conference publication : EnglishView all editions and formats
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Genre/Form: Conference papers and proceedings
Congresses
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Additional Physical Format: Print version:
International Conference on Characterization and Metrology for ULSI Technology (2000 : Gaithersburg, Md.).
Characterization and metrology for ULSI technology 2000.
Melville, N.Y. : American Institute of Physics, ©2000
(DLC) 00111547
(OCoLC)46652318
Material Type: Conference publication, Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: David G Seiler
OCLC Number: 71197538
Notes: "The 2000 International Conference on Characterization and Metrology for ULSI Technology was held at the National Institute of Standards and Technology from June 26 to June 29, 2000"--Preface.
Accompanying computer disc contains full text from the book.
Reproduction Notes: Electronic reproduction. [S.l.] : HathiTrust Digital Library, 2010. MiAaHDL
Description: 1 online resource (2 volumes) : illustrations.
Details: Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.
Contents: Transistor physics history --
Challenges --
Front end processes-materials --
Front end processes-gate dielectrics --
Front end processes --
Front end processes-electrical characterization --
Front end processes-in-situ --
Contamination and defect analysis --
Lithography --
Interconnect and back end processing --
Interconnect and back end processing-low -K --
Thin film --
Critical analytical techniques --
Critical analysis techniques-optical characterization --
Critical analysis techniques-physical characterization/x-rays --
Critical analytical techniques-atom probes/scanning probes --
Critical analytical techniques-sims/shallow junction analysis.
Series Title: AIP conference proceedings, no. 550.
Responsibility: editors David G. Seiler [and others].

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