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Chemical vapor deposited materials

Author: Francis S Galasso
Publisher: Boca Raton : CRC Press, ©1991.
Edition/Format:   Print book : EnglishView all editions and formats

Intended for researchers and scientists involved in the preparation of CVD materials, this book presents a concise description of the preparation, structure, and properties of some of the most  Read more...


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Document Type: Book
All Authors / Contributors: Francis S Galasso
ISBN: 0849342198 9780849342196
OCLC Number: 23870335
Description: 144 pages : illustrations ; 24 cm
Contents: INTRODUCTION. Equipment. Growth Process. Chemical Equilibrium. Coating Thickness. Applications. CVD Si3N4. Preparation. Structure. Properties. Oxidation. Applications. CVD SiC. Preparation. Structure. Properties. Oxidation. Applications. CVD BN. Preparation. Structure. Properties. Oxidation. Applications. OTHER CVD MATERIALS. CVD Materials. Aluminum. Aluminum Nitride. Aluminium Oxide. Boron. Boron Carbide. Carbon. Cobalt. Hafnium. Hafnium Carbide. Hafnium Nitride. Iron. Molybdenum. Molybdenum Boride. Molybdenum Carbide. Molybdenum Silicide. Nickel. Niobium. Niobium Carbide. Rhenium. Tantalum. Tantalum Boride. Tantalum Carbide. Tantalum Nitride. Titanium. Titanium Boride. Titanium Carbide. Titanium Nitride. Titanium Silicide. Tungsten. Tungsten Boride. Tungsten Carbide. Tungsten Silicide. Zirconium. Zirconium Boride. Zirconium Nitride. Zirconium Oxide. Index.
Responsibility: author, Francis S. Galasso.
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