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Chemical vapor deposition : principles and applications

Author: Michael L Hitchman; Klavs F Jensen
Publisher: London ; San Diego : Academic Press, ©1993.
Edition/Format:   Print book : EnglishView all editions and formats
Summary:

Covers recent developments in the theoretical understanding of the chemistry and physics of Chemical Vapour Deposition (CVD). The book emphasizes principles and understanding rather than specific  Read more...

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Additional Physical Format: Online version:
Chemical vapor deposition.
London ; San Diego : Academic Press, ©1993
(OCoLC)614841093
Material Type: Internet resource
Document Type: Book, Internet Resource
All Authors / Contributors: Michael L Hitchman; Klavs F Jensen
ISBN: 0123496705 9780123496706
OCLC Number: 27995365
Description: v, 677 pages : illustrations ; 24 cm
Contents: M.L. Hitchman and K.F. Jensen, Chemical Vapour Deposition--An Overview. K.F. Jensen, Fundamentals of Chemical Vapour Deposition. W.G. Breiland and P. Ho, Analysis of Chemical Vapor Deposition Processes. M.L. Hitchman and K.F. Jensen, Chemical Vapor Deposition at Low Pressures. B.S. Meyerson, Silicon Epitaxy by Chemical Vapor Deposition. R.L. Moon and Y.-M. Houng, Organometallic Vapor Phase Epitaxy of III-V Materials. D.W. Hess and D.B. Graves, Plasma-Assisted Chemical and Vapor Deposition. V.R. McCrary and V.M. Donnelly, Photo-Assisted Chemical Vapor Deposition. W.B. Jackson, Electronic and Optical Characterization of Chemical Vapor Deposition Films for Device Applications. G. Wahl, Protective Coatings. Index.
Responsibility: edited by Michael L. Hitchman and Klavs F. Jensen.
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