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Development of a polysilicon process based on chemical vapor deposition (phase 1 & phase 2)

Author: F Plahutnik; Hemlock Semiconductor Corporation.; United States. National Aeronautics and Space Administration.
Publisher: Hemlock, Mich. : Hemlock Semiconductor Corp., [1982]
Series: NASA contractor report, 173957.
Edition/Format:   Book   Microform : National government publication : Microfiche : English
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Material Type: Government publication, National government publication
Document Type: Book
All Authors / Contributors: F Plahutnik; Hemlock Semiconductor Corporation.; United States. National Aeronautics and Space Administration.
OCLC Number: 12075921
Notes: At head of title: Final report, 6 October 1979 to 25 June 1982.
"August 1982."
"JPL contract 955533."
"N84-34015"--Microfiche header.
"DOE/JPL 955533-83/7."
"DRL No 125."
"DRD SE-2."
Reproduction Notes: Microfiche. [Washington, D.C.? : National Aeronautics and Space Administration, 1984]. 2 microfiches.
Description: 1 volume : illustrations ; 28 cm.
Series Title: NASA contractor report, 173957.
Responsibility: prepared by F. Plahutnik, principal investigator and A. Arvidson, D. Sawyer, and K. Sharp.

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