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Effect of argon and hydrogen on deposition of silicon from tetrachlorosilane in cold plasmas

Author: R R Manory; Reuven Avni; A Grill; United States. National Aeronautics and Space Administration.
Publisher: [Washington, D.C.] : National Aeronautics and Space Administration ; [Springfield, Va.] : [For sale by the National Technical Information Service], [1985]
Series: NASA technical memorandum, 87219.
Edition/Format:   Book   Microform : National government publication : Microfiche : EnglishView all editions and formats
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Material Type: Government publication, National government publication
Document Type: Book
All Authors / Contributors: R R Manory; Reuven Avni; A Grill; United States. National Aeronautics and Space Administration.
OCLC Number: 22303594
Notes: Distributed to depository libraries in microfiche.
Reproduction Notes: Microfiche. [Washington, D.C.? : National Aeronautics and Space Administration], 1986. 1 microfiche.
Description: 1 volume.
Series Title: NASA technical memorandum, 87219.
Responsibility: R.R. Manory, R. Avni and A. Grill.

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