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  E-mail Message: I thought you might be interested in this item at http://www.worldcat.org/oclc/726148514 Title: Effects of plasma, temperature and chemical reactions on porous low dielectric films for semiconductor devices Author: Eric Osei-Yiadom; Richard F Reidy Publisher: [Denton, Tex.] : University of North Texas, 2010. OCLC:726148514

  
  

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Subjects

• Dielectric films.
• Semiconductors -- Materials.
• Plasma (Ionized gases)

Similar Items

Effects of plasma, temperature and chemical reactions on porous low dielectric films for semiconductor devices

Author:	Eric Osei-Yiadom; Richard F Reidy
Publisher:	[Denton, Tex.] : University of North Texas, 2010.
Dissertation:	Thesis (Ph. D.)--University of North Texas, Dec., 2010.
Edition/Format:	Thesis/dissertation : Document : Thesis/dissertation : eBook  Computer File : English
Rating:	(not yet rated) 0 with reviews - Be the first.