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Electron-beam, X-ray, and ion-beam submicrometer lithographies for manufacturing II : 8-9 March 1992, San Jose, California

Author: Martin Charles Peckerar; Society of Photo-optical Instrumentation Engineers.
Publisher: Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1992.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 1671.
Edition/Format:   Print book : Conference publication : EnglishView all editions and formats
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Genre/Form: Conference papers and proceedings
Congresses
Material Type: Conference publication, Internet resource
Document Type: Book, Internet Resource
All Authors / Contributors: Martin Charles Peckerar; Society of Photo-optical Instrumentation Engineers.
ISBN: 0819408263 9780819408266
OCLC Number: 26466509
Description: x, 488 pages : illustrations ; 28 cm.
Contents: SESSION 1: RESISTS FOR MANUFACTURING --
Resist optimization for SOR x-ray lithography using an orthogonal experimental design / W.G. Waldo [and others] --
Comparative evaluation of e-beam charge reducing processes / G.R. Amblard [and others] --
Simulation fidelity in microlithography / E. Barouch [and others] --
Manufacturing implementation of deep-UV lithography for 500-nm devices / S.J. Holmes [and others] --
Practical evaluation of 16M-DRAMs production with i-line phase-shift lithography / A. Usujima [and others] --
Model and measurement of resist heating effect in EBL / S.V. Babin [and others] --
SESSION 2: E-BEAM LITHOGRAPHY --
Advanced e-beam systems for manufacturing / H. Pfeiffer --
MEBES IV: a new generation raster-scan electron-beam lithography system / F.E. Abboud [and others] --
Mix-and-match lithography in a manufacturing environment / W.W. Flack [and others] --
Electron-beam lithography system for high-precision reticle making / T. Matsuzaka [and others] --
Study of single-layer e-beam lithography for x-ray mask making / Y. Kikuchi [and others] --
E-beam lithography at low voltages / Y. Lee [and others] --
Scanning tunneling microscope lithography: a viable lithographic technology? / C.R. Marrian [and others] --
Single-cycle lithography process for both large and sub-half-micron features / J.S. Sewell [and others] --
EB lithography for fabricating a GHz SAW filter on LiTaO₃ substrate / T. Nagata [and others] --
Effect of stitching errors on the performance of DFB lasers fabricated using e-beam lithography / T. Kjellberg [and others] --
Microstructural gated field emissions sources for electron-beam applications / G.W. Jones [and others] --
Computational method for the correction of proximity effect in electron-beam lithography / C. Chang [and others] --
Electron-beam lithography of optical elements for x-ray range / S.V. Babin, A.I. Erko --
SESSION 3: FOCUSED-ION-BEAM PROCESSING --
Focused-ion-beam repair of phase-shift photomasks / L.R. Harriott [and others] --
Focused-ion-beam cross-sectioning techniques using XeF₂ / D.K. Stewart, M.J. Vasile --
Resist cross-sectioning using focused ion beams / M.J. Vasile --
Chromatic and spherical aberration correction in axially symmetric electrostatic lenses / I.L. Berry --
Novel surface imaging process with ion-beam lithography and dry development / U.A. Jagdhold [and others] --
Low-damage anisotropic radical-beam ion-beam etching and selective chemical etching of focused-ion-beam-damaged GaAs substrates / J.A. Skidmore [and others] --
SESSION 4: RECENT DEVELOPMENTS IN X-RAY LITHOGRAPHY --
Why bother with x-ray lithography? / H.I. Smith, M.L. Schattenburg --
ALF: a facility for x-ray lithography II --
a progress report / L.G. Lesoine [and others] --
Evaluation of a laser-based proximity x-ray stepper / G.K. Celler [and others] --
Production of x-ray mask blanks for a point source stepper / L.E. Trimble [and others] --
Design of synchrotron x-ray lithography beamline / J.M. Oberschmidt [and others] --
X-ray optics design approach for an SXLS lithography beamline / A. Doumas, S. Kovacs --
Finite element analysis of dynamic thermal distortions of an x-ray mask for synchrotron radiation lithography / E.A. Haytcher [and others] --
Impact of CD control on circuit yield in submicron lithography / L. Milor --
Effects of mounting imperfections on an x-ray lithography mask / D.L. Laird, R.L Engelstad --
keV x-ray source based on high-repetition-rate excimer-laser-produced plasmas / R. Fedosejevs [and others] --
Spherical pinch x-ray generator (SPX II): prototype performance for x-ray lithography / S. Aithal [and others] --
Study of large-field beryllium window for SR lithography / K. Hara, T. Itoh --
Alignment and overlay acuracy of an advanced x-ray stepper using an improved alignment system / F. Gabeli [and others] --
Analysis of diffraction intensities in the Fresnel region for the x-ray lithography process optimization / H.J. Yoo --
Development of XUV projection lithography at 60-80 nm / B.E. Newnam, V.K. Viswanathan --
Practical tolerancing and performance implications of XUV projection lithography reduction systems / V.K. Viswanathan --
Optimization of partially coherent illumination in x-ray lithography / F. Cerrina, J.Z. Guo --
X-ray dose density: a new radiation damage modeling tool / F. Baszler [and others] --
Performances of the CXrL x-ray beamlines / R.K. Cole III [and others] --
Implementation of two-state alignment system into CXrL aligner / G. Chen [and others].
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 1671.
Other Titles: Submicrometer lithographies for manufacturing II
Responsibility: Martin Peckerar, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering.

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