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Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III : March 15-16, 1984, Santa Clara, California

Author: Alfred Wagner; International Society for Hybrid Microelectronics.
Publisher: Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, ©1984.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 471.
Edition/Format:   Print book : Conference publication : EnglishView all editions and formats
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Genre/Form: Conference papers and proceedings
Santa Clara (Calif., 1986)
Congresses
Additional Physical Format: Online version:
Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies III.
Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, ©1984
(OCoLC)714760463
Material Type: Conference publication
Document Type: Book
All Authors / Contributors: Alfred Wagner; International Society for Hybrid Microelectronics.
ISBN: 0892525061 9780892525065 089252667X 9780892526673
OCLC Number: 10939699
Description: vi, 136 pages : illustrations ; 28 cm.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 471.
Responsibility: Alfred Wagner, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.

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