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Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV : March 14-15, 1985, Santa Clara, California

Author: Phillip D Blais; International Society for Hybrid Microelectronics.
Publisher: Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, ©1985.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 537.
Edition/Format:   eBook : Document : Conference publication : EnglishView all editions and formats
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Genre/Form: Conference papers and proceedings
Congresses
Additional Physical Format: Print version:
Electron-beam, X-ray, and ion-beam techniques for submicrometer lithographies IV.
Bellingham, Wash., USA : SPIE--the International Society for Optical Engineering, ©1985
(DLC) 85061233
(OCoLC)12425377
Material Type: Conference publication, Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: Phillip D Blais; International Society for Hybrid Microelectronics.
OCLC Number: 564508547
Reproduction Notes: Electronic reproduction. [S.l.] : HathiTrust Digital Library, 2010. MiAaHDL
Description: 1 online resource (vi, 219 pages) : illustrations.
Details: Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 537.
Responsibility: Phillip D. Blais, chairman/editor ; cooperating organization, the International Society for Hybrid Microelectronics.

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Primary Entity

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