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Electron-beam, X-ray, and ion-beam techniques for submicron lithographies II : March 14-15, 1983, Santa Clara, California

Author: Phillip D Blais; Society of Photo-optical Instrumentation Engineers.
Publisher: Bellingham, Wash., USA : SPIE, ©1983.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 393.
Edition/Format:   Print book : EnglishView all editions and formats
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Document Type: Book
All Authors / Contributors: Phillip D Blais; Society of Photo-optical Instrumentation Engineers.
ISBN: 0892524286 9780892524280
OCLC Number: 10089729
Description: viii, 242 pages : illustrations ; 28 cm.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 393.
Responsibility: Phillip D. Blais, chairman/editor ; sponsored by SPIE--the International Society for Optical Engineering in cooperation with National Bureau of Standards, International Society for Hybrid Microelectronics, Northern California Microphotomask/Masking Working Group.

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