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Electron microbeam analysis

Author: A Boekestein; M K Pavićević
Publisher: Wien ; New York : Springer-Verlag, ©1992.
Series: Mikrochimica acta (Vienna, Austria : 1966)., Supplementum ;, 12.
Edition/Format:   Print book : Conference publication : EnglishView all editions and formats
Database:WorldCat
Summary:

This volume treats the different methods used in electron microbeam analysis. It consists of five tutorial chapters which give an overview and an in-depth analysis of a particular section of electron  Read more...

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Genre/Form: Conference papers and proceedings
Congresses
Material Type: Conference publication
Document Type: Book
All Authors / Contributors: A Boekestein; M K Pavićević
ISBN: 321182359X 9783211823590 038782359X 9780387823591
OCLC Number: 26822614
Notes: Contains selected papers from the Second Workshop of the European Microbeam Analysis Society on "Modern Developments and Applications in Microbeam Analysis," which took place in May 1991 in Dubrovnik, Yugoslavia.
Description: ix, 278 pages : illustrations ; 28 cm.
Contents: EPMA - A Versatile Technique for the Characterization of Thin Films and Layered Structures..- Quantitative EPMA of the Ultra-Light Elements Boron Through Oxygen..- Auger Microscopy and Electron Probe Microanalysis..- Quantitative X-Ray Microanalysis of Ultra-Thin Resin-Embedded Biological Samples..- Analytical and High-Resolution Electron Microscopy Studies at Metal/Ceramic Interfaces..- Quantitative Electron Probe Microanalysis of Multi-layer Structures..- Comparison of ? (?z) Curve Models in EPMA..- Quantitative Electron Probe Microanalysis: New Accurate ? (?z) Description..- A Modular Universal Correction Procedure for Quantitative EPMA..- Monte Carlo Simulation of Backscattered and Secondary Electron Profiles..- An Electron Scattering Model Applied to the Determination of Film Thicknesses Using Electron Probe Microanalysis..- Calculation of Depth Distribution Functions for Characteristic and for Continuous Radiation..- A Method for In-Situ Calibration of Semiconductor Detectors..- Background Anomalies in Electron Probe Microanalysis Caused by Total Reflection..- Automatic Analysis of Soft X-Ray Emission Spectra Obtained by EPMA..- The Scanning Very-Low-Energy Electron Microscopy (SVLEEM)..- To the Backscattering Contrast in Scanning Auger Microscopy..- Design Consideration Regarding the Use of an Accelerator on Mass Spectrometer in Ion Microanalysis..- Accurate Estimation of Uncertainties in Quantitative Electron Energy- Loss Spectrometry..- An EELS System for a TEM/STEM-Performance and Its Use in Materials Science..- Quantitative X-Ray Microanalysis of Bio-Organic Bulk Specimens..- Quantitative Analysis of (Y2O3)x (ZrO2)1-x Films on Silicon by EPMA..- EPMA of Surface Oxide Films..- Non-Destructive Determination of Ion-Implanted Impurity Distribution in Silicon by EPMA..- An Electron Spectroscopy Study of a-SiNx Films..- Electron Probe Microanalysis of Glass Fiber Optics..- Quantitative Microanalysis of Low Concentrations of Carbon In Steels..- Electron Configuration of the Valence-Conduction Band of the Mineral Wustite..- Structural Analysis of Silver Halide Cubic Microcrystals with Epitaxial or Conversion Growths by STEM-EDX..- Characterization of the Bony Matrix of the Otic Capsule in Human Fetuses by EPMA..- Overview..
Series Title: Mikrochimica acta (Vienna, Austria : 1966)., Supplementum ;, 12.
Responsibility: A. Boekestein and M.K. Pavićević (eds.).
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