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Emerging lithographic technologies II : 23-25 February 1998, Santa Clara, California

Author: Yuli Vladimirsky; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; SEMATECH (Organization)
Publisher: Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1998.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 3331.
Edition/Format:   Print book : Conference publication : EnglishView all editions and formats
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Genre/Form: Conference papers and proceedings
Santa Clara (Calif., 1998)
Congresses
Material Type: Conference publication
Document Type: Book
All Authors / Contributors: Yuli Vladimirsky; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; SEMATECH (Organization)
ISBN: 0819427764 9780819427762
OCLC Number: 39462033
Description: xiii, 702 pages : illustrations ; 28 cm.
Contents: EUV lithography --
X-ray lithography --
Novel lithographic technologies --
Mask technology for advanced lithography --
Electron-beam lithography --
Novel resist and process technology --
Poster session.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 3331.
Other Titles: Emerging lithographic technologies 2
Emerging lithographic technologies two
Responsibility: Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, SEMATECH.

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