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Emerging lithographic technologies III : 15-17 March, 1999, Santa Clara, California

Author: Yuli Vladimirsky; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.
Publisher: Bellingham, Wash. : Society of Photo-optical Instrumentation Engineers, ©1999.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 3676.
Edition/Format:   Print book : Conference publication : EnglishView all editions and formats
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Genre/Form: Conference papers and proceedings
Congresses
Additional Physical Format: Online version:
Emerging lithographic technologies III.
Bellingham, Wash. : SPIE, ©1999
(OCoLC)805924131
Material Type: Conference publication, Internet resource
Document Type: Book, Internet Resource
All Authors / Contributors: Yuli Vladimirsky; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.
ISBN: 0819431508 9780819431509
OCLC Number: 41946614
Description: 2 volumes (xvii, 864 pages) : illustrations ; 28 cm.
Contents: pt. 1. Cost analysis on the next-generation lithography technology / Y. Gomei ; X-ray lithography ; E-beam lithography ; Scalpel mask modeling and manufacturing ; Scalpel high-throughput system ; EUV lithography ; Novel lithographic and optical techniques ; Point x-ray and EUV sources --
pt. 2. Poster session : x-ray lithography ; Poster session : EUV lithography ; Poster session : novel lithographic and optical techniques ; Additional poster papers.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 3676.
Responsibility: Yuli Vladimirsky, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMI--Semiconductor Equipment and Materials International.

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Primary Entity

<http://www.worldcat.org/oclc/41946614> # Emerging lithographic technologies III : 15-17 March, 1999, Santa Clara, California
    a schema:Book, schema:CreativeWork ;
    library:oclcnum "41946614" ;
    library:placeOfPublication <http://experiment.worldcat.org/entity/work/data/366011017#Place/bellingham_wash> ; # Bellingham, Wash.
    library:placeOfPublication <http://id.loc.gov/vocabulary/countries/wau> ;
    schema:about <http://id.worldcat.org/fast/1181834> ; # X-ray lithography
    schema:about <http://id.worldcat.org/fast/1019883> ; # Microlithography
    schema:about <http://experiment.worldcat.org/entity/work/data/366011017#Topic/x_rays_industrial_applications> ; # X-rays--Industrial applications
    schema:about <http://experiment.worldcat.org/entity/work/data/366011017#Topic/microlithography_industrial_applications> ; # Microlithography--Industrial applications
    schema:about <http://id.worldcat.org/fast/1011095> ; # Masks (Electronics)
    schema:about <http://dewey.info/class/621.381531/e21/> ;
    schema:about <http://id.worldcat.org/fast/1019884> ; # Microlithography--Industrial applications
    schema:about <http://id.worldcat.org/fast/1000292> ; # Lithography, Electron beam
    schema:about <http://experiment.worldcat.org/entity/work/data/366011017#Topic/lithography_electron_beam> ; # Lithography, Electron beam
    schema:about <http://id.worldcat.org/fast/1181874> ; # X-rays--Industrial applications
    schema:about <http://experiment.worldcat.org/entity/work/data/366011017#Topic/x_ray_lithography> ; # X-ray lithography
    schema:bookFormat bgn:PrintBook ;
    schema:contributor <http://viaf.org/viaf/151856603> ; # Society of Photo-optical Instrumentation Engineers.
    schema:contributor <http://viaf.org/viaf/274231628> ; # Yuli Vladimirsky
    schema:contributor <http://viaf.org/viaf/137722322> ; # Semiconductor Equipment and Materials International.
    schema:copyrightYear "1999" ;
    schema:datePublished "1999" ;
    schema:description "pt. 1. Cost analysis on the next-generation lithography technology / Y. Gomei ; X-ray lithography ; E-beam lithography ; Scalpel mask modeling and manufacturing ; Scalpel high-throughput system ; EUV lithography ; Novel lithographic and optical techniques ; Point x-ray and EUV sources -- pt. 2. Poster session : x-ray lithography ; Poster session : EUV lithography ; Poster session : novel lithographic and optical techniques ; Additional poster papers."@en ;
    schema:exampleOfWork <http://worldcat.org/entity/work/id/366011017> ;
    schema:genre "Conference publication"@en ;
    schema:genre "Conference papers and proceedings"@en ;
    schema:inLanguage "en" ;
    schema:isPartOf <http://worldcat.org/issn/0277-786X> ; # SPIE proceedings serires,
    schema:isPartOf <http://experiment.worldcat.org/entity/work/data/366011017#Series/proceedings_of_spie_the_international_society_for_optical_engineering> ; # Proceedings of SPIE--the International Society for Optical Engineering ;
    schema:isSimilarTo <http://www.worldcat.org/oclc/805924131> ;
    schema:name "Emerging lithographic technologies III : 15-17 March, 1999, Santa Clara, California"@en ;
    schema:productID "41946614" ;
    schema:publication <http://www.worldcat.org/title/-/oclc/41946614#PublicationEvent/bellingham_wash_society_of_photo_optical_instrumentation_engineers_1999> ;
    schema:publisher <http://experiment.worldcat.org/entity/work/data/366011017#Agent/society_of_photo_optical_instrumentation_engineers> ; # Society of Photo-optical Instrumentation Engineers
    schema:url <http://link.spie.org/PSISDG/3676/1> ;
    schema:workExample <http://worldcat.org/isbn/9780819431509> ;
    wdrs:describedby <http://www.worldcat.org/title/-/oclc/41946614> ;
    .


Related Entities

<http://experiment.worldcat.org/entity/work/data/366011017#Agent/society_of_photo_optical_instrumentation_engineers> # Society of Photo-optical Instrumentation Engineers
    a bgn:Agent ;
    schema:name "Society of Photo-optical Instrumentation Engineers" ;
    .

<http://experiment.worldcat.org/entity/work/data/366011017#Place/bellingham_wash> # Bellingham, Wash.
    a schema:Place ;
    schema:name "Bellingham, Wash." ;
    .

<http://experiment.worldcat.org/entity/work/data/366011017#Series/proceedings_of_spie_the_international_society_for_optical_engineering> # Proceedings of SPIE--the International Society for Optical Engineering ;
    a bgn:PublicationSeries ;
    schema:hasPart <http://www.worldcat.org/oclc/41946614> ; # Emerging lithographic technologies III : 15-17 March, 1999, Santa Clara, California
    schema:name "Proceedings of SPIE--the International Society for Optical Engineering ;" ;
    .

<http://experiment.worldcat.org/entity/work/data/366011017#Topic/microlithography_industrial_applications> # Microlithography--Industrial applications
    a schema:Intangible ;
    schema:hasPart <http://id.loc.gov/authorities/subjects/sh85084858> ;
    schema:name "Microlithography--Industrial applications"@en ;
    .

<http://id.worldcat.org/fast/1000292> # Lithography, Electron beam
    a schema:Intangible ;
    schema:name "Lithography, Electron beam"@en ;
    .

<http://id.worldcat.org/fast/1011095> # Masks (Electronics)
    a schema:Intangible ;
    schema:name "Masks (Electronics)"@en ;
    .

<http://id.worldcat.org/fast/1019883> # Microlithography
    a schema:Intangible ;
    schema:name "Microlithography"@en ;
    .

<http://id.worldcat.org/fast/1019884> # Microlithography--Industrial applications
    a schema:Intangible ;
    schema:name "Microlithography--Industrial applications"@en ;
    .

<http://id.worldcat.org/fast/1181834> # X-ray lithography
    a schema:Intangible ;
    schema:name "X-ray lithography"@en ;
    .

<http://id.worldcat.org/fast/1181874> # X-rays--Industrial applications
    a schema:Intangible ;
    schema:name "X-rays--Industrial applications"@en ;
    .

<http://link.spie.org/PSISDG/3676/1>
    rdfs:comment "Rutgers restricted." ;
    .

<http://viaf.org/viaf/137722322> # Semiconductor Equipment and Materials International.
    a schema:Organization ;
    schema:name "Semiconductor Equipment and Materials International." ;
    .

<http://viaf.org/viaf/151856603> # Society of Photo-optical Instrumentation Engineers.
    a schema:Organization ;
    schema:name "Society of Photo-optical Instrumentation Engineers." ;
    .

<http://viaf.org/viaf/274231628> # Yuli Vladimirsky
    a schema:Person ;
    schema:familyName "Vladimirsky" ;
    schema:givenName "Yuli" ;
    schema:name "Yuli Vladimirsky" ;
    .

<http://worldcat.org/isbn/9780819431509>
    a schema:ProductModel ;
    schema:isbn "0819431508" ;
    schema:isbn "9780819431509" ;
    .

<http://worldcat.org/issn/0277-786X> # SPIE proceedings serires,
    a bgn:PublicationSeries ;
    schema:hasPart <http://www.worldcat.org/oclc/41946614> ; # Emerging lithographic technologies III : 15-17 March, 1999, Santa Clara, California
    schema:issn "0277-786X" ;
    schema:name "SPIE proceedings serires," ;
    .

<http://www.worldcat.org/oclc/805924131>
    a schema:CreativeWork ;
    rdfs:label "Emerging lithographic technologies III." ;
    schema:description "Online version:" ;
    schema:isSimilarTo <http://www.worldcat.org/oclc/41946614> ; # Emerging lithographic technologies III : 15-17 March, 1999, Santa Clara, California
    .

<http://www.worldcat.org/title/-/oclc/41946614>
    a genont:InformationResource, genont:ContentTypeGenericResource ;
    schema:about <http://www.worldcat.org/oclc/41946614> ; # Emerging lithographic technologies III : 15-17 March, 1999, Santa Clara, California
    schema:dateModified "2018-09-18" ;
    void:inDataset <http://purl.oclc.org/dataset/WorldCat> ;
    .


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