skip to content
Emerging lithographic technologies VIII : 24-26 February 2004, Santa Clara, California, USA Preview this item
ClosePreview this item
Checking...

Emerging lithographic technologies VIII : 24-26 February 2004, Santa Clara, California, USA

Author: R Scott Mackay; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.
Publisher: Bellingham, Wash., USA : SPIE, ©2004.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 5374.
Edition/Format:   eBook : Document : Conference publication : EnglishView all editions and formats
Summary:

Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.

Rating:

(not yet rated) 0 with reviews - Be the first.

Subjects
More like this

 

Find a copy online

Find a copy in the library

&AllPage.SpinnerRetrieving; Finding libraries that hold this item...

Details

Genre/Form: Conference papers and proceedings
Congresses
Congrès
Additional Physical Format: Print version:
Emerging lithographic technologies VIII.
Bellingham, Wash., USA : SPIE, ©2004
(DLC) 2004304504
(OCoLC)55686050
Material Type: Conference publication, Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: R Scott Mackay; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; International SEMATECH.
OCLC Number: 55731687
Description: 1 online resource (2 volumes (xxxviii, 1110 pages)) : illustrations.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 5374.
Other Titles: Emerging lithographic technologies 8
Emerging lithographic technologies eight
Responsibility: R. Scott Mackay, chair/editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organizations, SEMI--Semiconductor Equipment and Materials International, [and] International SEMATECH.

Reviews

User-contributed reviews
Retrieving GoodReads reviews...
Retrieving DOGObooks reviews...

Tags

Be the first.
Confirm this request

You may have already requested this item. Please select Ok if you would like to proceed with this request anyway.

Linked Data


Primary Entity

<http://www.worldcat.org/oclc/55731687> # Emerging lithographic technologies VIII : 24-26 February 2004, Santa Clara, California, USA
    a schema:Book, schema:CreativeWork, schema:MediaObject ;
   library:oclcnum "55731687" ;
   library:placeOfPublication <http://id.loc.gov/vocabulary/countries/wau> ;
   library:placeOfPublication <http://experiment.worldcat.org/entity/work/data/791976905#Place/bellingham_wash_usa> ; # Bellingham, Wash., USA
   schema:about <http://experiment.worldcat.org/entity/work/data/791976905#Topic/microlithographie_applications_industrielles> ; # Microlithographie--Applications industrielles
   schema:about <http://id.worldcat.org/fast/1011095> ; # Masks (Electronics)
   schema:about <http://experiment.worldcat.org/entity/work/data/791976905#Topic/microlithography_industrial_applications> ; # Microlithography--Industrial applications
   schema:about <http://experiment.worldcat.org/entity/work/data/791976905#Topic/x_rays_industrial_applications> ; # X-rays--Industrial applications
   schema:about <http://experiment.worldcat.org/entity/work/data/791976905#Topic/lithographie_par_faisceau_d_electrons> ; # Lithographie par faisceau d'électrons
   schema:about <http://id.worldcat.org/fast/1000292> ; # Lithography, Electron beam
   schema:about <http://experiment.worldcat.org/entity/work/data/791976905#Topic/lithography_electron_beam> ; # Lithography, Electron beam
   schema:about <http://experiment.worldcat.org/entity/work/data/791976905#Topic/lithographie_par_rayons_x> ; # Lithographie par rayons X
   schema:about <http://id.worldcat.org/fast/1181834> ; # X-ray lithography
   schema:about <http://experiment.worldcat.org/entity/work/data/791976905#Topic/rayons_x_applications_industrielles> ; # Rayons X--Applications industrielles
   schema:about <http://id.worldcat.org/fast/1019884> ; # Microlithography--Industrial applications
   schema:about <http://experiment.worldcat.org/entity/work/data/791976905#Topic/masques_electronique> ; # Masques (Électronique)
   schema:about <http://experiment.worldcat.org/entity/work/data/791976905#Topic/x_ray_lithography> ; # X-ray lithography
   schema:about <http://id.worldcat.org/fast/1181874> ; # X-rays--Industrial applications
   schema:alternateName "Emerging lithographic technologies 8" ;
   schema:alternateName "Emerging lithographic technologies eight" ;
   schema:bookFormat schema:EBook ;
   schema:contributor <http://viaf.org/viaf/159263522> ; # International SEMATECH.
   schema:contributor <http://viaf.org/viaf/137722322> ; # Semiconductor Equipment and Materials International.
   schema:contributor <http://viaf.org/viaf/151856603> ; # Society of Photo-optical Instrumentation Engineers.
   schema:copyrightYear "2004" ;
   schema:datePublished "2004" ;
   schema:editor <http://viaf.org/viaf/203946714> ; # R. Scott Mackay
   schema:exampleOfWork <http://worldcat.org/entity/work/id/791976905> ;
   schema:genre "Conference papers and proceedings"@en ;
   schema:genre "Conference publication"@en ;
   schema:inLanguage "en" ;
   schema:isPartOf <http://worldcat.org/issn/0277-786X> ; # Proceedings of SPIE,
   schema:isPartOf <http://experiment.worldcat.org/entity/work/data/791976905#Series/proceedings_of_spie_the_international_society_for_optical_engineering> ; # Proceedings of SPIE--the International Society for Optical Engineering ;
   schema:isSimilarTo <http://www.worldcat.org/oclc/55686050> ;
   schema:name "Emerging lithographic technologies VIII : 24-26 February 2004, Santa Clara, California, USA"@en ;
   schema:productID "55731687" ;
   schema:publication <http://www.worldcat.org/title/-/oclc/55731687#PublicationEvent/bellingham_wash_usa_spie_2004> ;
   schema:publisher <http://experiment.worldcat.org/entity/work/data/791976905#Agent/spie> ; # SPIE
   schema:url <http://books.google.com/books?id=BPdRAQAAIAAJ> ;
   schema:url <http://books.google.com/books?id=I_lRAQAAIAAJ> ;
   schema:url <http://link.spie.org/PSISDG/5374/1> ;
   schema:url <http://proceedings.spiedigitallibrary.org/volume.aspx?volume=5374> ;
   wdrs:describedby <http://www.worldcat.org/title/-/oclc/55731687> ;
    .


Related Entities

<http://experiment.worldcat.org/entity/work/data/791976905#Place/bellingham_wash_usa> # Bellingham, Wash., USA
    a schema:Place ;
   schema:name "Bellingham, Wash., USA" ;
    .

<http://experiment.worldcat.org/entity/work/data/791976905#Series/proceedings_of_spie_the_international_society_for_optical_engineering> # Proceedings of SPIE--the International Society for Optical Engineering ;
    a bgn:PublicationSeries ;
   schema:hasPart <http://www.worldcat.org/oclc/55731687> ; # Emerging lithographic technologies VIII : 24-26 February 2004, Santa Clara, California, USA
   schema:name "Proceedings of SPIE--the International Society for Optical Engineering ;" ;
    .

<http://experiment.worldcat.org/entity/work/data/791976905#Topic/lithographie_par_faisceau_d_electrons> # Lithographie par faisceau d'électrons
    a schema:Intangible ;
   schema:name "Lithographie par faisceau d'électrons"@fr ;
    .

<http://experiment.worldcat.org/entity/work/data/791976905#Topic/lithographie_par_rayons_x> # Lithographie par rayons X
    a schema:Intangible ;
   schema:name "Lithographie par rayons X"@fr ;
    .

<http://experiment.worldcat.org/entity/work/data/791976905#Topic/masques_electronique> # Masques (Électronique)
    a schema:Intangible ;
   schema:name "Masques (Électronique)"@fr ;
    .

<http://experiment.worldcat.org/entity/work/data/791976905#Topic/microlithographie_applications_industrielles> # Microlithographie--Applications industrielles
    a schema:Intangible ;
   schema:name "Microlithographie--Applications industrielles"@fr ;
    .

<http://experiment.worldcat.org/entity/work/data/791976905#Topic/rayons_x_applications_industrielles> # Rayons X--Applications industrielles
    a schema:Intangible ;
   schema:name "Rayons X--Applications industrielles"@fr ;
    .

<http://id.worldcat.org/fast/1000292> # Lithography, Electron beam
    a schema:Intangible ;
   schema:name "Lithography, Electron beam"@en ;
    .

<http://id.worldcat.org/fast/1011095> # Masks (Electronics)
    a schema:Intangible ;
   schema:name "Masks (Electronics)"@en ;
    .

<http://id.worldcat.org/fast/1019884> # Microlithography--Industrial applications
    a schema:Intangible ;
   schema:name "Microlithography--Industrial applications"@en ;
    .

<http://id.worldcat.org/fast/1181834> # X-ray lithography
    a schema:Intangible ;
   schema:name "X-ray lithography"@en ;
    .

<http://id.worldcat.org/fast/1181874> # X-rays--Industrial applications
    a schema:Intangible ;
   schema:name "X-rays--Industrial applications"@en ;
    .

<http://viaf.org/viaf/137722322> # Semiconductor Equipment and Materials International.
    a schema:Organization ;
   schema:name "Semiconductor Equipment and Materials International." ;
    .

<http://viaf.org/viaf/151856603> # Society of Photo-optical Instrumentation Engineers.
    a schema:Organization ;
   schema:name "Society of Photo-optical Instrumentation Engineers." ;
    .

<http://viaf.org/viaf/159263522> # International SEMATECH.
    a schema:Organization ;
   schema:name "International SEMATECH." ;
    .

<http://viaf.org/viaf/203946714> # R. Scott Mackay
    a schema:Person ;
   schema:familyName "Mackay" ;
   schema:givenName "R. Scott" ;
   schema:name "R. Scott Mackay" ;
    .

<http://worldcat.org/issn/0277-786X> # Proceedings of SPIE,
    a bgn:PublicationSeries ;
   schema:hasPart <http://www.worldcat.org/oclc/55731687> ; # Emerging lithographic technologies VIII : 24-26 February 2004, Santa Clara, California, USA
   schema:issn "0277-786X" ;
   schema:name "Proceedings of SPIE," ;
    .

<http://www.worldcat.org/oclc/55686050>
    a schema:CreativeWork ;
   rdfs:label "Emerging lithographic technologies VIII." ;
   schema:description "Print version:" ;
   schema:isSimilarTo <http://www.worldcat.org/oclc/55731687> ; # Emerging lithographic technologies VIII : 24-26 February 2004, Santa Clara, California, USA
    .

<http://www.worldcat.org/title/-/oclc/55731687>
    a genont:InformationResource, genont:ContentTypeGenericResource ;
   schema:about <http://www.worldcat.org/oclc/55731687> ; # Emerging lithographic technologies VIII : 24-26 February 2004, Santa Clara, California, USA
   schema:dateModified "2017-12-24" ;
   void:inDataset <http://purl.oclc.org/dataset/WorldCat> ;
    .


Content-negotiable representations

Close Window

Please sign in to WorldCat 

Don't have an account? You can easily create a free account.