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Emerging lithographic technologies X : 21-23 February, 2006, San Jose, California, USA

Author: Michael J Lercel; Society of Photo-optical Instrumentation Engineers.; International SEMATECH.
Publisher: Bellingham, Wash. : SPIE, ©2006.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 6151.
Edition/Format:   eBook : Document : Conference publication : EnglishView all editions and formats
Database:WorldCat
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Genre/Form: Conference papers and proceedings
Congresses
Additional Physical Format: (OCoLC)69860333
Material Type: Conference publication, Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: Michael J Lercel; Society of Photo-optical Instrumentation Engineers.; International SEMATECH.
OCLC Number: 68136020
Reproduction Notes: Electronic reproduction. Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 2006. Mode of access: World Wide Web. Access restricted to SPIE Digital Library subscribers.
Description: 2 volumes : illustrations ; 28 cm.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 6151.
Responsibility: Michael J. Lercel, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH, Inc (USA).

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Primary Entity

<http://www.worldcat.org/oclc/68136020> # Emerging lithographic technologies X : 21-23 February, 2006, San Jose, California, USA
    a schema:Book, schema:MediaObject, schema:CreativeWork ;
   library:oclcnum "68136020" ;
   library:placeOfPublication <http://experiment.worldcat.org/entity/work/data/367609831#Place/bellingham_wash> ; # Bellingham, Wash.
   library:placeOfPublication <http://id.loc.gov/vocabulary/countries/wau> ;
   schema:about <http://id.worldcat.org/fast/1181874> ; # X-rays--Industrial applications
   schema:about <http://experiment.worldcat.org/entity/work/data/367609831#Topic/x_rays_industrial_applications> ; # X-rays--Industrial applications
   schema:about <http://id.worldcat.org/fast/1019884> ; # Microlithography--Industrial applications
   schema:about <http://experiment.worldcat.org/entity/work/data/367609831#Topic/microlithography_industrial_applications> ; # Microlithography--Industrial applications
   schema:about <http://experiment.worldcat.org/entity/work/data/367609831#Topic/x_ray_lithography> ; # X-ray lithography
   schema:about <http://id.worldcat.org/fast/1000292> ; # Lithography, Electron beam
   schema:about <http://experiment.worldcat.org/entity/work/data/367609831#Topic/lithography_electron_beam> ; # Lithography, Electron beam
   schema:about <http://id.worldcat.org/fast/1011095> ; # Masks (Electronics)
   schema:about <http://id.worldcat.org/fast/1181834> ; # X-ray lithography
   schema:bookFormat schema:EBook ;
   schema:contributor <http://experiment.worldcat.org/entity/work/data/367609831#Person/lercel_michael_j_michael_james_1969> ; # Michael James Lercel
   schema:contributor <http://viaf.org/viaf/127619765> ; # Society of Photo-optical Instrumentation Engineers.
   schema:contributor <http://viaf.org/viaf/159263522> ; # International SEMATECH.
   schema:copyrightYear "2006" ;
   schema:datePublished "2006" ;
   schema:exampleOfWork <http://worldcat.org/entity/work/id/367609831> ;
   schema:genre "Conference publication"@en ;
   schema:genre "Conference papers and proceedings"@en ;
   schema:inLanguage "en" ;
   schema:isPartOf <http://experiment.worldcat.org/entity/work/data/367609831#Series/proceedings_of_spie_the_international_society_for_optical_engineering> ; # Proceedings of SPIE--the International Society for Optical Engineering ;
   schema:isPartOf <http://worldcat.org/issn/0277-786X> ; # Proceedings of SPIE,
   schema:isSimilarTo <http://www.worldcat.org/oclc/69860333> ;
   schema:name "Emerging lithographic technologies X : 21-23 February, 2006, San Jose, California, USA"@en ;
   schema:productID "68136020" ;
   schema:publication <http://www.worldcat.org/title/-/oclc/68136020#PublicationEvent/bellingham_wash_spie_2006> ;
   schema:publisher <http://experiment.worldcat.org/entity/work/data/367609831#Agent/spie> ; # SPIE
   schema:url <http://link.spie.org/PSISDG/6151/1> ;
   wdrs:describedby <http://www.worldcat.org/title/-/oclc/68136020> ;
    .


Related Entities

<http://experiment.worldcat.org/entity/work/data/367609831#Person/lercel_michael_j_michael_james_1969> # Michael James Lercel
    a schema:Person ;
   schema:birthDate "1969" ;
   schema:familyName "Lercel" ;
   schema:givenName "Michael James" ;
   schema:givenName "Michael J." ;
   schema:name "Michael James Lercel" ;
    .

<http://experiment.worldcat.org/entity/work/data/367609831#Place/bellingham_wash> # Bellingham, Wash.
    a schema:Place ;
   schema:name "Bellingham, Wash." ;
    .

<http://experiment.worldcat.org/entity/work/data/367609831#Series/proceedings_of_spie_the_international_society_for_optical_engineering> # Proceedings of SPIE--the International Society for Optical Engineering ;
    a bgn:PublicationSeries ;
   schema:hasPart <http://www.worldcat.org/oclc/68136020> ; # Emerging lithographic technologies X : 21-23 February, 2006, San Jose, California, USA
   schema:name "Proceedings of SPIE--the International Society for Optical Engineering ;" ;
    .

<http://id.worldcat.org/fast/1000292> # Lithography, Electron beam
    a schema:Intangible ;
   schema:name "Lithography, Electron beam"@en ;
    .

<http://id.worldcat.org/fast/1011095> # Masks (Electronics)
    a schema:Intangible ;
   schema:name "Masks (Electronics)"@en ;
    .

<http://id.worldcat.org/fast/1019884> # Microlithography--Industrial applications
    a schema:Intangible ;
   schema:name "Microlithography--Industrial applications"@en ;
    .

<http://id.worldcat.org/fast/1181834> # X-ray lithography
    a schema:Intangible ;
   schema:name "X-ray lithography"@en ;
    .

<http://id.worldcat.org/fast/1181874> # X-rays--Industrial applications
    a schema:Intangible ;
   schema:name "X-rays--Industrial applications"@en ;
    .

<http://viaf.org/viaf/127619765> # Society of Photo-optical Instrumentation Engineers.
    a schema:Organization ;
   schema:name "Society of Photo-optical Instrumentation Engineers." ;
    .

<http://viaf.org/viaf/159263522> # International SEMATECH.
    a schema:Organization ;
   schema:name "International SEMATECH." ;
    .

<http://worldcat.org/issn/0277-786X> # Proceedings of SPIE,
    a bgn:PublicationSeries ;
   schema:hasPart <http://www.worldcat.org/oclc/68136020> ; # Emerging lithographic technologies X : 21-23 February, 2006, San Jose, California, USA
   schema:issn "0277-786X" ;
   schema:name "Proceedings of SPIE," ;
    .

<http://www.worldcat.org/oclc/69860333>
    a schema:CreativeWork ;
   schema:isSimilarTo <http://www.worldcat.org/oclc/68136020> ; # Emerging lithographic technologies X : 21-23 February, 2006, San Jose, California, USA
    .

<http://www.worldcat.org/title/-/oclc/68136020>
    a genont:InformationResource, genont:ContentTypeGenericResource ;
   schema:about <http://www.worldcat.org/oclc/68136020> ; # Emerging lithographic technologies X : 21-23 February, 2006, San Jose, California, USA
   schema:dateModified "2016-05-10" ;
   void:inDataset <http://purl.oclc.org/dataset/WorldCat> ;
    .


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