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Gate stack and silicide issues in silicon processing II : symposium held April 17-19, 2001, San Francisco, California, U.S.A.

Author: S A Campbell; et al
Publisher: Warrendale, Pa. : Materials Research Society, ©2002.
Series: Materials Research Society symposia proceedings, v. 670.
Edition/Format:   Print book : Conference publication : EnglishView all editions and formats
Summary:

As technologists consider scaling microelectronic devices below the 100nm node, it is clear that many new materials will be introduced into the fab line. Determining the best materials and the best  Read more...

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Genre/Form: Conference papers and proceedings
San Francisco (Calif., 2001)
Congresses
Additional Physical Format: Online version:
Gate stack and silicide issues in silicon processing II.
Warrendale, Pa. : Materials Research Society, ©2002
(OCoLC)714761241
Material Type: Conference publication, Internet resource
Document Type: Book, Internet Resource
All Authors / Contributors: S A Campbell; et al
ISBN: 1558996060 9781558996069
OCLC Number: 49513689
Description: 1 v. (various pagings) : ill. ; 24 cm.
Series Title: Materials Research Society symposia proceedings, v. 670.
Responsibility: editors, S.A. Campbell ... [et al.].
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