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  E-mail Message: I thought you might be interested in this item at http://www.worldcat.org/oclc/41903605 Title: The growth and properties of silicon oxide and oxynitride gate dielectric Author: Kenneth Alexander Ellis Publisher: ©1998. OCLC:41903605

  
  

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The growth and properties of silicon oxide and oxynitride gate dielectric

Author:	Kenneth Alexander Ellis
Dissertation:	Thesis (Ph. D.)--Cornell University, Aug., 1998.
Edition/Format:	Thesis/dissertation : Thesis/dissertation : Manuscript  Archival Material : EnglishView all editions and formats
Rating:	(not yet rated) 0 with reviews - Be the first.