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Handbook of vacuum arc science and technology : fundamentals and applications

Author: R L Boxman; David M Sanders; Philip J Martin
Publisher: Park Ridge, N.J., U.S.A. : Noyes Publications, ©1995.
Series: Materials science and process technology series.
Edition/Format:   Print book : EnglishView all editions and formats
Summary:

describes basic physics of the vacuum arc. This text also describes the applications of the vacuum arc for depositing thin films and coatings, refining metals, switching high power, and as sources of  Read more...

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Additional Physical Format: Online version:
Handbook of vacuum arc science and technology.
Park Ridge, N.J., U.S.A. : Noyes Publications, ©1995
(OCoLC)604968727
Material Type: Internet resource
Document Type: Book, Internet Resource
All Authors / Contributors: R L Boxman; David M Sanders; Philip J Martin
ISBN: 0815513755 9780815513759
OCLC Number: 32665287
Description: xxxi, 742 pages : illustrations ; 25 cm.
Contents: Part I: Fundamentals of Vacuum Arc Science and TechnologyElectrical Discharges and Plasmas-A Brief TutorialArc IgnitionCathode SpotsThe Interelectrode PlasmaAnode PhenomenaPart II: Applications of Vacuum Arc Science and TechnologyCoatings From the Vacuum ArcVacuum Arc Metal ProcessingVacuum Switching of High Current and High Voltage at Power FrequenciesPulsed Power ApplicationsIndexAbout the Contributors
Series Title: Materials science and process technology series.
Responsibility: edited by Raymond L. Boxman, David M. Sanders, Philip J. Martin ; foreword by James M. Lafferty.
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