skip to content
Handbook of VLSI microlithography : principles, technology, and applications Preview this item
ClosePreview this item
Checking...

Handbook of VLSI microlithography : principles, technology, and applications

Author: William B Glendinning; John N Helbert
Publisher: Park Ridge, N.J., U.S.A. : Noyes Publications, ©1991.
Series: Materials science and process technology series.
Edition/Format:   eBook : Document : EnglishView all editions and formats
Summary:
This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random  Read more...
Rating:

(not yet rated) 0 with reviews - Be the first.

Subjects
More like this

Find a copy in the library

&AllPage.SpinnerRetrieving; Finding libraries that hold this item...

Details

Genre/Form: Electronic books
Additional Physical Format: Print version:
Handbook of VLSI microlithography.
Park Ridge, N.J., U.S.A. : Noyes Publications, ©1991
(DLC) 90023646
(OCoLC)22731519
Material Type: Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: William B Glendinning; John N Helbert
ISBN: 9781437728224 1437728227
OCLC Number: 555773428
Reproduction Notes: Electronic reproduction. [S.l.] : HathiTrust Digital Library, 2010. MiAaHDL
Description: 1 online resource (xxii, 649 pages) : illustrations.
Details: Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.
Contents: Issues and Trends Affecting Lithography Tool Selection Strategy Resist Technology u Design, Processing, and Applications Lithography Process Monitoring and Defect Detection Techniques and Tools for Photo Metrology Techniques and Tools for Optical Lithography Microlithography Tool Automation Electron-Beam ULSI Applications Rational Vibration and Structural Dynamics for Lithographic Tool Installations Applications of Ion Microbeams Lithography and Direct Processing X-Ray Lithography Part I Part II Acknowledgment References Index
Series Title: Materials science and process technology series.
Responsibility: edited by William B. Glendinning, John N. Helbert.
More information:

Abstract:

Offers a look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings - including optical lithography,  Read more...

Reviews

User-contributed reviews
Retrieving GoodReads reviews...
Retrieving DOGObooks reviews...

Tags

Be the first.
Confirm this request

You may have already requested this item. Please select Ok if you would like to proceed with this request anyway.

Linked Data


Primary Entity

<http://www.worldcat.org/oclc/555773428> # Handbook of VLSI microlithography : principles, technology, and applications
    a schema:CreativeWork, schema:MediaObject, schema:Book ;
   library:oclcnum "555773428" ;
   library:placeOfPublication <http://experiment.worldcat.org/entity/work/data/1106191076#Place/park_ridge_n_j_u_s_a> ; # Park Ridge, N.J., U.S.A.
   library:placeOfPublication <http://id.loc.gov/vocabulary/countries/nju> ;
   schema:about <http://experiment.worldcat.org/entity/work/data/1106191076#Topic/photolithographie_halbleitertechnologie> ; # Photolithographie (Halbleitertechnologie)
   schema:about <http://id.worldcat.org/fast/975602> ; # Integrated circuits--Very large scale integration
   schema:about <http://experiment.worldcat.org/entity/work/data/1106191076#Topic/vlsi> ; # VLSI
   schema:about <http://experiment.worldcat.org/entity/work/data/1106191076#Topic/lithographie_halbleitertechnologie> ; # Lithographie (Halbleitertechnologie)
   schema:about <http://id.worldcat.org/fast/1019883> ; # Microlithography
   schema:about <http://id.loc.gov/authorities/subjects/sh85067125> ; # Integrated circuits--Very large scale integration
   schema:about <http://dewey.info/class/621.381531/e20/> ;
   schema:about <http://experiment.worldcat.org/entity/work/data/1106191076#Topic/technology_&_engineering_mechanical> ; # TECHNOLOGY & ENGINEERING--Mechanical
   schema:bookFormat schema:EBook ;
   schema:contributor <http://viaf.org/viaf/36083802> ; # John N. Helbert
   schema:contributor <http://viaf.org/viaf/58246977> ; # William B. Glendinning
   schema:copyrightYear "1991" ;
   schema:datePublished "1991" ;
   schema:description "This handbook gives readers a close look at the entire technology of printing very high resolution and high density integrated circuit (IC) patterns into thin resist process transfer coatings-- including optical lithography, electron beam, ion beam, and x-ray lithography. The book's main theme is the special printing process needed to achieve volume high density IC chip production, especially in the Dynamic Random Access Memory (DRAM) industry. The book leads off with a comparison of various lithography methods, covering the three major patterning parameters of line/space, resolution, line edge and pattern feature dimension control. The book's explanation of resist and resist process equipment technology may well be the first practical description of the relationship between the resist process and equipment parameters. The basics of resist technology are completely covered -- including an entire chapter on resist process defectivity and the potential yield limiting effect on device production. Each alternative lithographic technique and testing method is considered and evaluated: basic metrology including optical, scanning-electron-microscope (SEM) techniques and electrical test devices, along with explanations of actual printing tools and their design, construction and performance. The editor devotes an entire chapter to today's sophisticated, complex electron-beam printers, and to the emerging x-ray printing technology now used in high-density CMOS devices. Energetic ion particle printing is a controllable, steerable technology that does not rely on resist, and occupies a final section of the handbook."@en ;
   schema:exampleOfWork <http://worldcat.org/entity/work/id/1106191076> ;
   schema:genre "Electronic books"@en ;
   schema:inLanguage "en" ;
   schema:isPartOf <http://experiment.worldcat.org/entity/work/data/1106191076#Series/materials_science_and_process_technology_series> ; # Materials science and process technology series.
   schema:isSimilarTo <http://www.worldcat.org/oclc/22731519> ;
   schema:name "Handbook of VLSI microlithography : principles, technology, and applications"@en ;
   schema:productID "555773428" ;
   schema:publication <http://www.worldcat.org/title/-/oclc/555773428#PublicationEvent/park_ridge_n_j_u_s_a_noyes_publications_1991> ;
   schema:publisher <http://experiment.worldcat.org/entity/work/data/1106191076#Agent/noyes_publications> ; # Noyes Publications
   schema:url <http://catalog.hathitrust.org/api/volumes/oclc/22731519.html> ;
   schema:url <http://www.myilibrary.com?id=513173> ;
   schema:url <http://books.google.com/books?id=GiRTAAAAMAAJ> ;
   schema:url <http://www.sciencedirect.com/science/book/9780815512813> ;
   schema:url <http://search.ebscohost.com/login.aspx?direct=true&scope=site&db=nlebk&db=nlabk&AN=635216> ;
   schema:workExample <http://worldcat.org/isbn/9781437728224> ;
   wdrs:describedby <http://www.worldcat.org/title/-/oclc/555773428> ;
    .


Related Entities

<http://experiment.worldcat.org/entity/work/data/1106191076#Agent/noyes_publications> # Noyes Publications
    a bgn:Agent ;
   schema:name "Noyes Publications" ;
    .

<http://experiment.worldcat.org/entity/work/data/1106191076#Place/park_ridge_n_j_u_s_a> # Park Ridge, N.J., U.S.A.
    a schema:Place ;
   schema:name "Park Ridge, N.J., U.S.A." ;
    .

<http://experiment.worldcat.org/entity/work/data/1106191076#Series/materials_science_and_process_technology_series> # Materials science and process technology series.
    a bgn:PublicationSeries ;
   schema:hasPart <http://www.worldcat.org/oclc/555773428> ; # Handbook of VLSI microlithography : principles, technology, and applications
   schema:name "Materials science and process technology series." ;
   schema:name "Materials science and process technology series" ;
    .

<http://experiment.worldcat.org/entity/work/data/1106191076#Topic/lithographie_halbleitertechnologie> # Lithographie (Halbleitertechnologie)
    a schema:Intangible ;
   schema:name "Lithographie (Halbleitertechnologie)"@en ;
    .

<http://experiment.worldcat.org/entity/work/data/1106191076#Topic/photolithographie_halbleitertechnologie> # Photolithographie (Halbleitertechnologie)
    a schema:Intangible ;
   schema:name "Photolithographie (Halbleitertechnologie)"@en ;
    .

<http://experiment.worldcat.org/entity/work/data/1106191076#Topic/technology_&_engineering_mechanical> # TECHNOLOGY & ENGINEERING--Mechanical
    a schema:Intangible ;
   schema:name "TECHNOLOGY & ENGINEERING--Mechanical"@en ;
    .

<http://id.loc.gov/authorities/subjects/sh85067125> # Integrated circuits--Very large scale integration
    a schema:Intangible ;
   schema:name "Integrated circuits--Very large scale integration"@en ;
    .

<http://id.worldcat.org/fast/1019883> # Microlithography
    a schema:Intangible ;
   schema:name "Microlithography"@en ;
    .

<http://id.worldcat.org/fast/975602> # Integrated circuits--Very large scale integration
    a schema:Intangible ;
   schema:name "Integrated circuits--Very large scale integration"@en ;
    .

<http://viaf.org/viaf/36083802> # John N. Helbert
    a schema:Person ;
   schema:familyName "Helbert" ;
   schema:givenName "John N." ;
   schema:name "John N. Helbert" ;
    .

<http://viaf.org/viaf/58246977> # William B. Glendinning
    a schema:Person ;
   schema:familyName "Glendinning" ;
   schema:givenName "William B." ;
   schema:name "William B. Glendinning" ;
    .

<http://worldcat.org/isbn/9781437728224>
    a schema:ProductModel ;
   schema:isbn "1437728227" ;
   schema:isbn "9781437728224" ;
    .

<http://www.worldcat.org/oclc/22731519>
    a schema:CreativeWork ;
   rdfs:label "Handbook of VLSI microlithography." ;
   schema:description "Print version:" ;
   schema:isSimilarTo <http://www.worldcat.org/oclc/555773428> ; # Handbook of VLSI microlithography : principles, technology, and applications
    .


Content-negotiable representations

Close Window

Please sign in to WorldCat 

Don't have an account? You can easily create a free account.