Find a copy in the library
Finding libraries that hold this item...
Details
| Document Type: | Book |
|---|---|
| All Authors / Contributors: |
John E Ayers |
| ISBN: | 0849371953 9780849371950 |
| OCLC Number: | 70878051 |
| Description: | 455 p. : ill. ; 25 cm. |
| Contents: | Introduction Properties of Semiconductors Introduction Crystallographic Properties Lattice Constants and Thermal Expansion Coefficients Elastic Properties Surface Free Energy Dislocations Planar Defects Problems References Heteroepitaxial Growth Introduction Vapor Phase Epitaxy (VPE) Molecular Beam Epitaxy (MBE) Silicon, Germanium, and Si1-xGex Alloys Silicon Carbide III-Arsenides, III-Phosphides, and III-Antimonides III-Nitrides II-VI Semiconductors Conclusion Problems References Surface and Chemical Considerations in Heteroepitaxy Introduction Surface Reconstructions Nucleation Growth Modes Nucleation Layers Surfactants in Heteroepitaxy Quantum Dots and Self-Assembly Problems References Mismatched Heteroepitaxial Growth and Strain Relaxation Introduction Pseudomorphic Growth and the Critical Layer Thickness Dislocation Sources Interactions between Misfit Dislocations Lattice Relaxation Mechanisms Quantitative Models for Lattice Relaxation Lattice Relaxation on Vicinal Substrates: Crystallographic Tilting of Heteroepitaxial Layers Lattice Relaxation in Graded Layers Lattice Relaxation in Superlattices and Multilayer Structures Dislocation Coalescence, Annihilation, and Removal in Relaxed Heteroepitaxial Layers Thermal Strain Cracking in Thick Films Problems References Characterization of Heteroepitaxial Layers Introduction X-Ray Diffraction Electron Diffraction Microscopy Crystallographic Etching Techniques Photoluminescence Growth Rate and Layer Thickness Composition and Strain Determination of Critical Layer Thickness Crystal Orientation Defect Types and Densities Multilayered Structures and Superlattices Growth Mode Problems References Defect Engineering in Heteroepitaxial Layers Introduction Buffer Layer Approaches Reduced Area Growth Using Patterned Substrates Patterning and Annealing Epitaxial Lateral Overgrowth (ELO) Pendeo-Epitaxy Nanoheteroepitaxy Planar Compliant Substrates Free-Standing Semiconductor Films Conclusion Problems References Appendix A: Bandgap Engineering Diagrams Appendix B: Lattice Constants and Coefficients of Thermal Expansion Appendix C: Elastic Constants Appendix D: Critical Layer Thickness Appendix E: Crystallographic Etches Appendix F: Tables for X-Ray Diffraction Index |
| Responsibility: | John E. Ayers. |
| More information: |
Reviews
User-contributed reviews
Add a review and share your thoughts with other readers.
Be the first.
Add a review and share your thoughts with other readers.
Be the first.
Tags
Add tags for "Heteroepitaxy of semiconductors : theory, growth, and characterization".
Be the first.
