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In fitting memory : the art and politics of Holocaust memorials

Auteur : Sybil Milton; Ira Nowinski; Judah L. Magnes Memorial Museum.
Éditeur : Detroit : Wayne State University Press ; Berkeley : Judah L. Magnes Museum, ©1991.
Édition/format :   Livre : AnglaisVoir toutes les éditions et tous les formats
Base de données :WorldCat
Résumé :
A survey of Holocaust memorials and monuments in Europe, Israel and us focuses on archaeological remains at the original Nazi sites, which constitute the first post-war memorials. featuring text and photos, the book shows how, since 1945, memorials have served not only as secular shrines but also as temporal institutions reflecting changing consciousness and distinctive political, social and social context. two  Lire la suite...
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Format – détails additionnels : Online version:
Milton, Sybil.
In fitting memory.
Detroit : Wayne State University Press ; Berkeley : Judah L. Magnes Museum, ©1991
(OCoLC)551298813
Format : Livre
Tous les auteurs / collaborateurs : Sybil Milton; Ira Nowinski; Judah L. Magnes Memorial Museum.
ISBN : 081432066X 9780814320662
Numéro OCLC : 23766968
Description : 341 pages : illustrations ; 22 x 27 cm
Contenu : THE MEMORIALIZATION OF THE HOLOCAUST:The Chronological and Political Contexts --
CONCENTRATION CAMP ARCHEOLOGY: The Landscapes of Memory --
THE GENERATIONS OF MEMORY --
THE AESTHETICS OF MEMORIAL PHOTOGRAPHY --
SELECTED LIST OF HOLOCAUST MEMORIAL SITES --
TECHNICAL NOTES ABOUT THE PHOTOGRAPHS.
Responsabilité : text by Sybil Milton ; photographs by Ira Nowinski.

Résumé :

A survey of Holocaust memorials and monuments in Europe, Israel and us focuses on archaeological remains at the original Nazi sites, which constitute the first post-war memorials. featuring text and photos, the book shows how, since 1945, memorials have served not only as secular shrines but also as temporal institutions reflecting changing consciousness and distinctive political, social and social context. two questions are posed: to whose memory were they built? and how fitting are they?

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