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Instrumentation, metrology, and standards for nanomanufacturing III : 3-5 August 2009, San Diego, California

Author: Michael T Postek; John A Allgair; SPIE (Society)
Publisher: Bellingham, Wash. : SPIE, ©2009.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 7405.
Edition/Format:   eBook : Document : Conference publication : EnglishView all editions and formats
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Genre/Form: Conference papers and proceedings
Congresses
Additional Physical Format: Print version:
Instrumentation, metrology, and standards for nanomanufacturing III.
Bellingham, Wash. : SPIE, ©2009
(OCoLC)457890329
Material Type: Conference publication, Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: Michael T Postek; John A Allgair; SPIE (Society)
OCLC Number: 437009400
Notes: Title from PDF title page (SPIE digital library, viewed September 18, 2009).
Description: 1 online resource : illustrations (some color).
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 7405.
Responsibility: Michael T. Postek, John A. Allgair, editors ; sponsored and published SPIE ; technical cosponsor, NIST--National Institute of Standards and Technology (United States).

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