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Integrated circuits : chemical and physical processing : developed from the winter symposium sponsored by the Division of Industrial and Engineering Chemistry of the American Chemical Society, University of California--Davis, March 26-27, 1984

Author: Pieter Stroeve; American Chemical Society. Division of Industrial and Engineering Chemistry.; American Chemical Society. Division of Industrial and Engineering Chemistry. Winter Symposium
Publisher: Washington, D.C. : American Chemical Society, 1985.
Series: ACS symposium series, 290.
Edition/Format:   Print book : EnglishView all editions and formats
Summary:

Explores the complex physical and chemical operations that are designed to build structures or modify properties of materials in very thin films. Covers fundamental phenomena occurring in unit  Read more...

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Genre/Form: Kongress
Conference papers and proceedings
Congresses
Congrès
Additional Physical Format: Online version:
Integrated circuits.
Washington, D.C. : American Chemical Society, 1985
(OCoLC)560291172
Material Type: Internet resource
Document Type: Book, Internet Resource
All Authors / Contributors: Pieter Stroeve; American Chemical Society. Division of Industrial and Engineering Chemistry.; American Chemical Society. Division of Industrial and Engineering Chemistry. Winter Symposium
ISBN: 0841209405 9780841209404
ISSN:0097-6156
OCLC Number: 12549975
Description: ix, 348 pages : illustrations ; 24 cm.
Contents: Unit processes in the manufacture of integrated circuits / Pieter Stroeve --
Conservation laws for mass, momentum, and energy : application to semiconductor devices and technology / Bill Baerg --
Silicon oxidation : a process step for the manufacture of integrated circuits / Eugene A. Irene --
Convective diffusion in zone refining of low Prandtl number liquid metals and semiconductors / William N. Gill, Nicholas D. Kazarinoff, and John D. Verhoeven --
Research opportunities in resist technology / David S. Soong --
Physical and chemical modifications of photoresists / Peter C. Sukanek --
Effects of developer concentration on linewidth control in positive photoresists / Tom Batchelder --
The advantage of molecular-beam epitaxy for device applications / A.Y. Cho --
Chemical and physical processing of ion-implanted integrated circuits / Joseph C. Plunkett --
Plasma-assisted processing : the etching of polysilicon in a diatomic chlorine discharge / Herbert H. Sawin, Albert D. Richards, and Brian E. Thompson --
Applications of oxides and nitrides of germanium for semiconductor devices / O.J. Gregory and E.E. Crisman --
Vapor-phase epitaxy of Group III-V compound optoelectronic devices / G.H. Olsen --
Advanced device isolation for very large scale integration / H.B. Pogge --
Solid-liquid equilibrium in ternary Group III-V semiconductor materials / T.L. Aselage, K.M. Chang, and T.J. Anderson : preparation of device-quality strained-layer superlattices / R.M. Biefeld --
Wafer design and characterization for integrated-circuit processes / R. Schindler, D. Huber, and J. Reffle.
Series Title: ACS symposium series, 290.
Responsibility: Pieter Stroeve, editor.
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