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Introduction to surface and thin film processes

Author: John Venables
Publisher: Cambridge, UK ; New York : Cambridge University Press, 2000.
Edition/Format:   Print book : EnglishView all editions and formats
Summary:
"This book covers the experimental and theoretical understanding of surface and thin film processes. It presents a unique description of surface processes in adsorption and crystal growth, including bonding in metals and semiconductors. Emphasis is placed on the strong link between science and technology in the description of, and research for, new devices based on thin film and surface science. Practical
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Material Type: Internet resource
Document Type: Book, Internet Resource
All Authors / Contributors: John Venables
ISBN: 0521624606 9780521624602 0521785006 9780521785006
OCLC Number: 43114310
Description: xvi, 372 pages : illustrations ; 26 cm
Contents: Introduction to surface processes --
Surfaces in a vacuum : ultra-high vacuum techniques and processes --
Electron-based techniques for examining surface and thin film processes --
Surface processes in adsorption --
Surface processes in epitaxial growth --
Electronic structure and emission processes at metallic surfaces --
Semiconductor surfacess and interfaces --
Surface processes in thin film devices --
Postscript --
where do we go from here?
Responsibility: John A. Venables.
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Abstract:

Graduate textbook and sourcebook on surface and thin film processes, with links to the World Wide Web.  Read more...

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'Well-ordered, and extraordinarily well-referenced chapters ... gives the reader an in-depth and bang-up-to-date guide to the fields covered.' Ian Forbes, Materials World 'John Venables provides a Read more...

 
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