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Ion beams : new applications from mesoscale to nanoscale : symposium held April 25-29, 2011, San Francisco, California, U.S.A.

Author: John E E Baglin; Materials Research Society.
Publisher: Warrendale, Pa. : Materials Research Society ; Oxford [England] ; New York : Cambridge University Press, 2012.
Series: Materials Research Society symposia proceedings, v. 1354.
Edition/Format:   Print book : Conference publication : EnglishView all editions and formats
Database:WorldCat
Summary:

Symposium II, 'Ion Beams - New Applications from Mesoscale to Nanoscale', was held at the 2011 MRS Spring Meeting.

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Genre/Form: Conference papers and proceedings
Congresses
Additional Physical Format: Online version:
Symposium II, "Ion Beams - New Applications From Mesoscale to Nanoscale" (2011 : San Francisco, Calif.).
Ion beams.
Warrendale, Pa. : Materials Research Society ; Oxford : Cambridge University Press, 2012
(OCoLC)784124264
Material Type: Conference publication, Internet resource
Document Type: Book, Internet Resource
All Authors / Contributors: John E E Baglin; Materials Research Society.
ISBN: 9781605113319 160511331X
OCLC Number: 780332279
Notes: "Symposium II, 'Ion Beams--New Applications From Mesoscale to Nanoscale' was held at the 2011 MRS Spring Meeting, April 25-29, 2011 in San Francisco, California"--Page xi.
Description: xi, 163 pages : illustrations ; 24 cm.
Contents: Universal biomolecule binding interlayers created by energetic ion bombardment --
Neural cell attachment on metal ion implanted glass surfaces --
Cluster ion beam processing: review of current and prospective applications --
Nano-engineering with a focused helium ion beam --
Multi-ion beam lithography and processing studies --
Ion irradiation effects in silicon nanowires --
Folding graphene with swift heavy ions --
Ion irradiation on phase change materials --
Ion beams for synthesis and modifications of nanostructures in semiconductors --
Raman scattering study of Si nanoclusters formed in Si through a double Au implantation --
Effects of hydrogen ion implantation and thermal annealing on structural and optical properties of single-crystal sapphire --
Post-CMOS integration of nanomechanical devices by direct ion beam irradiation of silicon --
Enhanced adhesion of coating layers by ion beam mixing: an application for nuclear hydrogen production --
Structural changes induced by swift heavy ion beams in tensile strained Al(1-x)InxN/GaN hetero-structures --
5 MeV Si ion modification on thermoelectric SiO2/SiO2+Cu multilayer films --
Study of scalable IBS nanopatterning mechanisms for III-V semiconductors using in-situ surface characterization --
Modeling of approximated electron transport across ion beam patterned quantum dot nanostructures --
RBS, XRD, raman and AFM studies of microwave synthesized Ge nanocrystals --
Comparison of ion beam and electron beam induced transport of hot charge carriers in metal-insulator-metal junctions --
Future directions for ion beam technology and research: forum report.
Series Title: Materials Research Society symposia proceedings, v. 1354.
Responsibility: editors, John Baglin [and others].
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