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Ion implantation : basics to device fabrication

Author: E Rimini
Publisher: Boston : Kluwer Academic Publishers, ©1995.
Series: Kluwer international series in engineering and computer science, SECS 293.; Kluwer international series in engineering and computer science., Electronic materials, science and technology.
Edition/Format:   Print book : EnglishView all editions and formats
Summary:

Ion implantation offers one of the best examples of a topic that starting from the basic research level has reached the high technology level within the framework of microelectronics.

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Material Type: Internet resource
Document Type: Book, Internet Resource
All Authors / Contributors: E Rimini
ISBN: 0792395204 9780792395201
OCLC Number: 31171598
Description: xii, 393 pages : illustrations ; 25 cm.
Contents: Preface. List of Tables. 1. Semiconductor Devices. 2. Ion Implanters. 3. Range Distribution. 4. Radiation Damage. 5. Annealing and Secondary Defects. 6. Analytical Techniques. 7. Silicon Based Devices. 8. Ion Implantation in Compound Semiconductor and Buried Layer Synthesis. Selected References. References. Index.
Series Title: Kluwer international series in engineering and computer science, SECS 293.; Kluwer international series in engineering and computer science., Electronic materials, science and technology.
Responsibility: by Emanuele Rimini.
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