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Laser Processing of Thin Films and Microstructures : Oxidation, Deposition and Etching of Insulators

Author: Ian W Boyd
Publisher: Berlin, Heidelberg : Springer Berlin Heidelberg, 1987.
Series: Springer series in materials science, 3.
Edition/Format:   eBook : Document : EnglishView all editions and formats
Summary:
This text aims at providing a comprehensive and up to date treatment of the new and rapidly expanding field of laser pro cessing of thin films, particularly, though by no means exclu sively, of recent progress in the dielectrics area. The volume covers all the major aspects of laser processing technology in general, from the background and history to its many potential applications, and from the theory to the  Read more...
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Genre/Form: Electronic books
Additional Physical Format: Print version:
Material Type: Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: Ian W Boyd
ISBN: 9783642831362 3642831362
OCLC Number: 851387513
Language Note: English.
Description: 1 online resource (viii, 320 pages 77 illustrations).
Contents: 1. Introduction --
1.1 Historical Background --
1.2 Advantages of Laser Technology --
1.3 Requirements for Laser Processing --
1.4 Outline --
2. Interaction and Kinetics --
2.1 Laser Excitation of Matter --
2.2 Laser Excitation of the Gas Species --
2.3 Interaction of Laser Radiation with Solids --
2.4 Interactions with Surfaces and Adsorbates --
2.5 Laser-Induced Heating --
2.6 Nucleation and Growth --
2.7 Chemical Reactions and Growth Rates --
3. Experimental Considerations --
3.1 Properties of Laser Beams --
3.2 Spatial Resolution --
3.3 Modes of Laser Processing --
3.4 The Choice of Laser --
4. Laser-Assisted Oxidation and Nitridation --
4.1 Oxidation --
4.2 Background and Theory --
4.3 Metal Oxidation --
4.4 Silicon Oxidation --
4.5 Oxidation of Compound Semiconductors --
4.6 Nitridation --
4.7 Laser Curing --
5. Passivation by Laser Annealing and Melting --
5.1 Modes of Laser Annealing --
5.2 Laser Annealing in Oxygen --
5.3 Oxygen Implantation --
5.4 Nitrogen Implantation --
5.5 Impurity Effects --
5.6 Laser Cleaning of Surfaces --
6. Laser-Induced Deposition --
6.1 Background --
6.2 Metal Oxides --
6.3 Silicon Oxide --
6.4 Silicon Nitride --
6.5 Organic Polymer Formation --
7. Material Removal --
7.1 Introduction and Background --
7.2 Etching --
7.3 Ablation --
7.4 Trimming --
7.5 Cutting and Drilling --
8. Summary and Conclusions --
8.1 Properties and Applications --
8.2 Future Prospects --
8.3 Postscript --
References.
Series Title: Springer series in materials science, 3.
Responsibility: by Ian W. Boyd.

Abstract:

This text aims at providing a comprehensive and up to date treatment of the new and rapidly expanding field of laser pro- cessing of thin films, particularly, though by no means exclu- sively, of  Read more...

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