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Metrology, inspection, and process control for microlithography XI : 10-12 March, 1997, Santa Clara, California

Author: Susan K Jones; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; SEMATECH (Organization); SPIE Digital Library.
Publisher: Bellingham, Washington : SPIE, ©1997.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 3050.
Edition/Format:   eBook : Document : Conference publication : EnglishView all editions and formats
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Genre/Form: Conference papers and proceedings
Congresses
Additional Physical Format: (OCoLC)37380371
Material Type: Conference publication, Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: Susan K Jones; Society of Photo-optical Instrumentation Engineers.; Semiconductor Equipment and Materials International.; SEMATECH (Organization); SPIE Digital Library.
ISBN: 0819424641 9780819424648
OCLC Number: 64131112
Reproduction Notes: Electronic reproduction. Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 2005. Mode of access: World Wide Web. Access restricted to SPIE Digital Library subscribers.
Description: x, 636 pages : illustrations ; 28 cm.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 3050.
Responsibility: Susan K. Jones, chair/editor ; sponsored and published by SPIE--the International Society for Optical Engineering ; cooperating organizations SEMI--Semiconductor Equipment and Materials International, SEMATECH.

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