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Metrology, inspection, and process control for microlithography XX : 20-23 February 2006, San Jose, California, USA

Author: Chas N Archie; International SEMATECH.
Publisher: Bellingham, Wash. : SPIE, ©2006.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 6152.
Edition/Format:   eBook : Document : Conference publication : EnglishView all editions and formats
Database:WorldCat
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Genre/Form: Conference papers and proceedings
Congresses
Additional Physical Format: (OCoLC)69922475
Material Type: Conference publication, Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: Chas N Archie; International SEMATECH.
ISBN: 9780819461957 0819461954
OCLC Number: 68136022
Reproduction Notes: Electronic reproduction. Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 2006. Mode of access: World Wide Web. Access restricted to SPIE Digital Library subscribers.
Description: 2 volumes (various pagings) : illustrations ; 28 cm.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 6152.
Responsibility: Chas N. Archie, chair/editor ; cooperating organization, I SEMATECH ; sponsored and published by SPIE--the International Society for Optical Engineering.

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Linked Data


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