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Metrology, inspection, and process control for microlithography XXI : 26 February- 1 March 2007, San Jose, California, USA

Author: Chas N Archie; Society of Photo-optical Instrumentation Engineers.; International SEMATECH.
Publisher: Bellingham, Wash. : SPIE, ©2007.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 6518.
Edition/Format:   eBook : Document : Conference publication : EnglishView all editions and formats
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Proceedings of SPIE offer access to the latest innovations in research and technology and are among the most cited references in patent literature.

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Genre/Form: Conference papers and proceedings
Congresses
Additional Physical Format: Metrology, inspection, and process control for microlithography XXI.
Bellingham, Wash. : SPIE, ©2007
(OCoLC)144527799
Material Type: Conference publication, Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: Chas N Archie; Society of Photo-optical Instrumentation Engineers.; International SEMATECH.
ISBN: 9780819466372 0819466379
OCLC Number: 144757560
Reproduction Notes: Electronic reproduction. Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 2007. Mode of access: World Wide Web. Access restricted to SPIE Digital Library subscribers.
Description: 3 volumes : illustrations (chiefly color) ; 28 cm.
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 6518.
Other Titles: SPIE digital library.
Responsibility: Chas N. Archie, editor ; sponsored ... by SPIE--the International Society for Optical Engineering ; cooperating organization, SEMATECH (USA).

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