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Inhaltsverzeichnis lizenzfrei
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| Material Type: | Internet resource |
|---|---|
| Document Type: | Book, Internet Resource |
| All Authors / Contributors: |
Kazuaki Suzuki; Bruce W Smith |
| ISBN: | 9780824790240 0824790243 |
| OCLC Number: | 71581976 |
| Description: | 848 p. : ill. ; 27 cm. |
| Contents: | EXPOSURE SYSTEM System Overview of Optical Steppers and Scanners; Michael S. Hibbs Optical Lithography Modeling; Chris A. Mack Optics for Photolithography; Bruce W. Smith Excimer Laser for Advanced Microlithography; Palash Das Alignment and Overlay; Gregg M. Gallatin Electron Beam Lithography System; Kazuaki Suzuki X-Ray Lithography; Takumi Ueno EUV Lithography; Stefan Wurm and Charles Gwyn Imprint Lithography; Douglas J. Resnick RESISTS AND PROCESSING Chemistry of Photoresist Materials; Takumi Ueno and Robert D. Allen Resist Processing; Bruce W. Smith Multilayer Resist Technology; Bruce W. Smith and Maureen Hanratty Dry Etching of Photoresists; Roderick R. Kunz METROLOGY AND NANOLITHOGRAPHY Critical-Dimensional Metrology for Integrated-Circuit Technology; Herschel M. Marchman, Gian Lorusso, Mike Adel, and Sanjay Yedur Electron Beam Nanolithography; Elizabeth A. Dobisz, Zvonimir Z. Bandic, and Martin C. Peckerar Index |
| Series Title: | Optical science and engineering (Boca Raton, Fla.), 126. |
| Responsibility: | edited by Kazuaki Suzuki, Bruce W. Smith. |
| More information: |
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Related Subjects:(9)
- Microlithography -- Industrial applications.
- Integrated circuits -- Masks.
- Metal oxide semiconductors, Complementary -- Design and construction.
- Manufacturing processes.
- Microlithographie -- Applications industrielles.
- Circuits intégrés -- Masques.
- MOS complémentaires -- Conception et construction.
- Fabrication.
- Lithographie (Halbleitertechnologie)
