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Microlithography : science and technology
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Microlithography : science and technology

Author: Kazuaki Suzuki; Bruce W Smith
Publisher: Boca Raton : CRC Press, ©2007.
Series: Optical science and engineering (Boca Raton, Fla.), 126.
Edition/Format:   Book : English : 2nd edView all editions and formats
Summary:

Describes both elementary and advanced aspects of sub micron micro lithography. This text covers optics, excimer laser light sources, and alignment techniques and analysis, as well as resist  Read more...

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Details

Material Type: Internet resource
Document Type: Book, Internet Resource
All Authors / Contributors: Kazuaki Suzuki; Bruce W Smith
ISBN: 9780824790240 0824790243
OCLC Number: 71581976
Description: 848 p. : ill. ; 27 cm.
Contents: EXPOSURE SYSTEM System Overview of Optical Steppers and Scanners; Michael S. Hibbs Optical Lithography Modeling; Chris A. Mack Optics for Photolithography; Bruce W. Smith Excimer Laser for Advanced Microlithography; Palash Das Alignment and Overlay; Gregg M. Gallatin Electron Beam Lithography System; Kazuaki Suzuki X-Ray Lithography; Takumi Ueno EUV Lithography; Stefan Wurm and Charles Gwyn Imprint Lithography; Douglas J. Resnick RESISTS AND PROCESSING Chemistry of Photoresist Materials; Takumi Ueno and Robert D. Allen Resist Processing; Bruce W. Smith Multilayer Resist Technology; Bruce W. Smith and Maureen Hanratty Dry Etching of Photoresists; Roderick R. Kunz METROLOGY AND NANOLITHOGRAPHY Critical-Dimensional Metrology for Integrated-Circuit Technology; Herschel M. Marchman, Gian Lorusso, Mike Adel, and Sanjay Yedur Electron Beam Nanolithography; Elizabeth A. Dobisz, Zvonimir Z. Bandic, and Martin C. Peckerar Index
Series Title: Optical science and engineering (Boca Raton, Fla.), 126.
Responsibility: edited by Kazuaki Suzuki, Bruce W. Smith.
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