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Modeling aspects in optical metrology : 18-19 June 2007, Munich, Germany

Author: Harald BosseBernd BodermannRichard M SilverEuropean Optical Society.Wissenschaftliche Gesellschaft Lasertechnik.All authors
Publisher: Bellingham, Wash. : SPIE, 2007.
Series: Proceedings of SPIE--the International Society for Optical Engineering, v. 6617.
Edition/Format:   eBook : Document : Conference publication : EnglishView all editions and formats
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Genre/Form: Conference papers and proceedings
Congresses
Additional Physical Format: Modeling aspects in optical metrology.
Bellingham, Wash. : SPIE, ©2007
(OCoLC)162506070
Material Type: Conference publication, Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: Harald Bosse; Bernd Bodermann; Richard M Silver; European Optical Society.; Wissenschaftliche Gesellschaft Lasertechnik.; Society of Photo-optical Instrumentation Engineers.
ISBN: 9780819467591 0819467596
OCLC Number: 159928989
Reproduction Notes: Electronic reproduction. Bellingham, Wash. : SPIE--the International Society for Optical Engineering, 2007. (SPIE digital library) Mode of access: World Wide Web. Access restricted to SPIE Digital Library subscribers.
Description: 1 online resource (1 volume (various pagings) :) : illustrations.
Contents: Simulation of the detectors response of an autocollimator / Gerald Fütterer --
Capabilities and limitations of paraxial operator approach for modeling of nano-scale feature evaluation / Alexander Normatov, Boris Spektor, and Joseph Shamir --
Modeling image formation on pixelated devices for vision systems using wave-front codings / Salvador Bosch [and others] --
Lateral shear and digital holographic microscopy to check dynamic behaviour of biological cell / Lisa Miccio [and others] --
MTF assessment of dual waveband diffractive lenses / Jose M. Infante Herrero and Marta C. de la Fuente --
The influence of target distance to lens distortion variation / Christian Bräuer-Burchardt --
Numerical simulation tool for synthetic speckle pattern images and their intensity-based integration under variable conditions for metrology applications / Falko Riechert, Georg Bastian, and Uli Lemmer --
Modeling of image formation of a low-cost white-light bench microscope with a linear CMOS image sensor: its application in metrology / Milton P. Macedo [and others] --
Modeling of propagation of ultrashort light pulses in optical systems / Antonin Miks, Jiri Novak, and Pavel Novak --
Multiple multipole program analysis of metallic optical waveguides / Christian Hafner [and others] --
Sharp trench waveguide bend with photonic crystals: simulation, fabrication and characterization / Xudong Cui [and others] --
Frequency-domain simulations of optical antenna structures / Christian Hafner [and others] --
Apodised fibre bragg grating design for gain flattening of EDFA / Anubhuti Khare and Arun Khare --
Scattering at silver-enhanced gold particles inside subwavelength-apertured metallic layers / Tilman Glaser --
Computer and experimental modeling of light scattering at random and fractal surfaces / Oleg V. Angelsky, Alexander P. Maksimyak, and Peter P. Maksimyak --
Effect of broadband illumination on reconstruction error of phase retrieval in optical metrology / Gregory R. Brady and James R. Fienup --
Phase retrieval using a random amplitude mask for wavefront sensing / Arun Anand [and others] --
The optical vortex interferometer with a wavefront division / Jan Masajada, Agnieszka Popioek-Masajada, and Monika Leniec --
Applications of optical vortex birefringence compensator / Monika Borwińska, Piotr Kurzynowski, and Agnieszka Popioek-Masajada --
Opportunities and limits for interferometry in production control / Thomas Blümel [and others] --
Practical implementation of the complex wavefront modulation model for optical alignment / Hanshin Lee [and others] --
Robust Shack-Hartmann wavefront sensing with ultraflat microaxicons / R. Grunwald, M. Bock, and S. Huferath --
Fresnel wavefront propagation model for shearography shape measurement / Arun Anand [and others] --
Single fringe pattern demodulation using local adaptable quadrature filters / J.C. Estrada and M. Servin --
Adaptive MBPE algorithm for speeding up the computation / K. Tavzarashvili [and others] --
Enhancements to FDTD modeling for optical metrology applications / Bartlomiej Salski, Malgorzata Celuch, and Wojciech Gwarek --
3D simulations of electromagnetic fields in nanostructures using the time-harmonic finite-element method / Sven Burger [and others] --
Model-based analysis of the limits of optical metrology with experimental comparisons / R.M. Silver, R. Attota, and E. Marx --
In-chip overlay metrology for 45nm processes / Y.S. Ku [and others] --
An approach to validation of rigorous modeling in optical CD microscopy by comparison of measurement results with independent methods / B. Bodermann and H. Bosse --
Comparison of rigorous modelling of different structure profiles on photomasks for quantitative linewidth measurements by means of UV- or DUV-optical microscopy / Gerd Ehret, Bernd Bodermann, and Martin Woehler --
Optical characterization procedure for large thin films / Juan F. Trigo [and others] --
In-line etching process control using dynamic scatterometry / Sébastien Soulan [and others] --
Optical scatterometry with analytic approaches applied to periodic nano-arrays including anisotropic layers / I. Abdulhalim --
Scatterometry from crossed grating structures in different configurations / Thomas Schuster [and others] --
Numerical analysis of DUV scatterometry on EUV masks / Matthias Wurm [and others] --
Structure modeling for scatterometric characterization of photoinduced surface-relief gratings / Petre C. Logofatu [and others] --
Finite element analysis of EUV lithography / Jan Pomplun [and others] --
A rigorous solution for electromagnetic scattering from any kind of asperities of multilayer 1-D structures in the X-ray-VUV ranges / Leonid I. Goray --
The influence of line edge roughness and CD uniformity on EUV scatterometry for CD characterization of EUV masks / Frank Scholze [and others] --
Optimal sets of measurement data for profile reconstruction in scatterometry / H. Gross [and others].
Series Title: Proceedings of SPIE--the International Society for Optical Engineering, v. 6617.
Other Titles: SPIE digital library.
Responsibility: Harald Bosse, Bernd Bodermann, Richard M. Silver, editors ; sponsored by SPIE Europe ; cooperating organizations, EOS--European Optical Society [and] WLT--Wissenschaftliche Gesellschaft Lasertechnik e.V. (Germany).

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