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Modeling of chemical vapor deposition of tungsten films

Author: Chris R Kleijn; Christoph Werner
Publisher: Basel ; Boston : Birkhäuser Verlag, 1993.
Series: Progress in numerical simulation for microelectronics, vol. 2.
Edition/Format:   eBook : Document : EnglishView all editions and formats
Database:WorldCat
Summary:
Semiconductor equipment modeling has in recent years become a field of great interest, because it offers the potential to support development and optimization of manufacturing equipment and hence reduce the cost and improve the quality of the reactors. This book is the result of two parallel lines of research dealing with the same subject - Modeling of Tungsten CVD processes -, which were per formed independently  Read more...
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Genre/Form: Electronic books
Additional Physical Format: Print version:
Kleijn, Chris R., 1960-
Modeling of chemical vapor deposition of tungsten films.
Basel ; Boston : Birkhäuser Verlag, 1993
(DLC) 92044681
(OCoLC)27187530
Material Type: Document, Internet resource
Document Type: Internet Resource, Computer File
All Authors / Contributors: Chris R Kleijn; Christoph Werner
ISBN: 9783034877411 3034877412 9783034877435 3034877439
OCLC Number: 623448811
Reproduction Notes: Electronic reproduction. [S.l.] : HathiTrust Digital Library, 2010. MiAaHDL
Description: 1 online resource (138 pages) : illustrations.
Details: Master and use copy. Digital master created according to Benchmark for Faithful Digital Reproductions of Monographs and Serials, Version 1. Digital Library Federation, December 2002.
Contents: Principal Symbols --
1 Introduction --
2 Mathematical models for chemical vapor deposition --
3 Thermal modeling --
4 Blanket tungsten deposition --
5 Selective tungsten deposition --
6 Conclusions.
Series Title: Progress in numerical simulation for microelectronics, vol. 2.
Responsibility: Chris R. Kleijn, Christoph Werner.

Abstract:

Combines the presentation of models and numerical methods used in CVD simulation with a variety of technical applications for tungsten deposition in semiconductor technology.  Read more...

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