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Nano-CMOS gate dielectric engineering

Author: Hei Wong
Publisher: Boca Raton : CRC Press, 2012.
Edition/Format:   Print book : EnglishView all editions and formats
Summary:
This book is a systematic review of high-K gate dielectric materials for CMOS chips (complementary metaloxide semiconductors), which are used in image sensors and data convertors (amplifiers, digital camera sensors, etc). Scaling CMOS devices down to the nanoscale creates new materials challenges, and one effective response is to introduce novel materials such as High K dielectrics. The book presents the fundamental  Read more...
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Document Type: Book
All Authors / Contributors: Hei Wong
ISBN: 9781439849590 1439849595
OCLC Number: 613423659
Description: xiv, 234 pages : illustrations ; 24 cm
Contents: 1. Overview of CMOS technology --
2. High-k dielectrics --
3. Complex forms of high-k oxides --
4. Dielectric interfaces --
5. Impacts on device operation --
6. Fabrication issues --
7. Conclusions.
Responsibility: Hei Wong.

Abstract:

This book is a systematic review of high-K gate dielectric materials for CMOS chips (complementary metaloxide semiconductors), which are used in image sensors and data convertors (amplifiers, digital camera sensors, etc). Scaling CMOS devices down to the nanoscale creates new materials challenges, and one effective response is to introduce novel materials such as High K dielectrics. The book presents the fundamental physics and properties of High-K materials and how they can be fabricated and used in Nano CMOS device - See more at: http://www.betterworldbooks.com/nano-cmos-gate-dielectric-engineering-id-1439849595.aspx&utm_source=Affiliate&utm_campaign=Text&utm_medium=booklink&utm_term=3630151&utm_content=Homepage#sthash.mhf9DArw.dpuf.

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... this book, by covering almost every aspect of high-k gate dielectric engineering for nano-CMOS technology, is as timely as ever for device and process engineers. Though it involves quite a lot of Read more...

 
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