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Next generation of international chemical additives : a critical review of current US patents Preview this item
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Next generation of international chemical additives : a critical review of current US patents

Author: Thomas F DeRosa
Publisher: Amsterdam ; Boston : Elsevier, [2013] ©2013
Edition/Format:   Print book : EnglishView all editions and formats
Database:WorldCat
Summary:
This book identifies the next generation chemical additives for eight selected industries. The text also provides methods for their preparation, additive treatment levels, and testing methods to evaluate additive performance.--
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Details

Genre/Form: Patents
Document Type: Book
All Authors / Contributors: Thomas F DeRosa
ISBN: 9780444537881 0444537880
OCLC Number: 795763209
Description: xi, 565 pages : illustrations ; 24 cm
Responsibility: Thomas F. DeRosa.

Abstract:

The objective is writing 'Next Generation Chemical Additives' to identify next generation chemical additives for eight selected industries. This title includes applications using identified chemical  Read more...
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