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Optical imaging in projection microlithography

Author: Alfred Kwok-Kit Wong
Publisher: Bellingham, WA : SPIE Optical Engineering Press, 2005.
Series: Tutorial texts in optical engineering, v. TT 66.
Edition/Format:   Print book : EnglishView all editions and formats
Summary:
Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a  Read more...
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Document Type: Book
All Authors / Contributors: Alfred Kwok-Kit Wong
ISBN: 0819458295 9780819458292
OCLC Number: 57594753
Description: xix, 254 pages : illustrations ; 26 cm.
Contents: 1. Basic electromagnetism. 1.1. Maxwell's equations --
1.2. Electromagnetic energy --
1.3. The wave equation --
1.4. Plane waves --
1.5. Spherical waves --
1.6. Harmonic waves --
1.7. Quasi-monochromatic light. 2. Elements of geometrical optics. 2.1. The eikonal equation --
2.2. Light rays --
2.3. Snell's law --
2.4. Thin lens --
2.5. Representation of an exposure system. 3. Elements of diffraction theory. 3.1. Qualitative consideration --
3.2. Reciprocity --
3.3. The Helmholtz-Kirchhoff theorem --
3.4. Fresnel-Kirchhoff diffraction --
3.5. The Rayleigh-Sommerfeld diffraction formula --
3.6. Fraunhofer diffraction --
3.7. Fraunhofer diffraction patterns. 4. Imaging of extended objects with finite sources. 4.1. Coherent illumination --
4.2. Obliquity factor --
4.3. Spatial correlation of light --
4.4. Köhler's illumination method --
4.5. Partially coherent imaging. 5. Resolution and image enhancement. 5.1. Image intensity spectrum --
5.2. Binary intensity objects under on-axis illumination --
5.3. Off-axis illumination --
5.4. Attenuated phase-shifting mask --
5.5. Alternating phase-shifting mask --
5.6. Minimum half-pitch --
5.7. Minimum dimension. 6. Oblique rays. 6.1. Polarization --
6.2. Vector imaging --
6.3. Wave propagation across a dielectric interface --
6.4. Stratified media --
6.5. Intensity distribution in photoresist --
6.6. Immersion imaging --
6.7. Imaging with oblique rays. 7. Aberrations. 7.1. Diffraction of an aberrated wavefront --
7.2. General properties of the aberration function --
7.3. Zernike polynomials --
7.4. Effects on imaging --
7.5. Measurement. 8. Numerical computation. 8.1. Imaging equations --
8.2. Transmission cross-coefficient integration --
8.3. Source points integration --
8.4. Coherent decomposition --
8.5. Object spectrum --
8.6. Remarks. 9. Variabilities. 9.1. Categorization --
9.2. Proximity effect --
9.3. Object variabilities (photomask errors) --
9.4. Polarization effects --
9.5. Illumination --
9.6. Pupil --
9.7. Focus --
9.8. Dose --
9.9. Flare --
9.10. Remarks. A. Birefringence --
B. Stationarity and ergodicity --
C. Some Zernike polynomials --
D. Simulator accuracy tests --
E. Select refractive indexes --
F. Assorted theorems and identities --
Bibliography --
Solutions to exercises --
Index.
Series Title: Tutorial texts in optical engineering, v. TT 66.
Responsibility: Alfred Kwok-Kit Wong.

Abstract:

An integrated mathematical view of the physics and numerical modeling of optical projection lithography that covers the full spectrum of the important concepts. Readers with a good working knowledge  Read more...

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Primary Entity

<http://www.worldcat.org/oclc/57594753> # Optical imaging in projection microlithography
    a schema:CreativeWork, schema:Book ;
   library:oclcnum "57594753" ;
   library:placeOfPublication <http://experiment.worldcat.org/entity/work/data/908149#Place/bellingham_wa> ; # Bellingham, WA
   library:placeOfPublication <http://id.loc.gov/vocabulary/countries/wau> ;
   schema:about <http://dewey.info/class/621.381531/e22/> ;
   schema:about <http://id.worldcat.org/fast/967605> ; # Imaging systems
   schema:about <http://experiment.worldcat.org/entity/work/data/908149#Topic/microlithographie> ; # Microlithographie
   schema:about <http://experiment.worldcat.org/entity/work/data/908149#Topic/lithographie_halbleitertechnologie> ; # Lithographie (Halbleitertechnologie)
   schema:about <http://experiment.worldcat.org/entity/work/data/908149#Topic/imagerie_technique> ; # Imagerie (technique)
   schema:about <http://id.worldcat.org/fast/1019883> ; # Microlithography
   schema:bookFormat bgn:PrintBook ;
   schema:creator <http://viaf.org/viaf/201089371> ; # Alfred Kwok-Kit Wong
   schema:datePublished "2005" ;
   schema:description "Here for the first time is an integrated mathematical view of the physics and numerical modeling of optical projection lithography that efficiently covers the full spectrum of the important concepts. Alfred Wong offers rigorous underpinning, clarity in systematic formulation, physical insight into emerging ideas, as well as a system-level view of the parameter tolerances required in manufacturing. Readers with a good working knowledge of calculus can follow the step-by-step development, and technologists can gather general concepts and the key equations that result. Even the casual reader will gain a perspective on the key concepts, which will likely help facilitate dialog among technologists."@en ;
   schema:description "1. Basic electromagnetism. 1.1. Maxwell's equations -- 1.2. Electromagnetic energy -- 1.3. The wave equation -- 1.4. Plane waves -- 1.5. Spherical waves -- 1.6. Harmonic waves -- 1.7. Quasi-monochromatic light."@en ;
   schema:exampleOfWork <http://worldcat.org/entity/work/id/908149> ;
   schema:inLanguage "en" ;
   schema:isPartOf <http://experiment.worldcat.org/entity/work/data/908149#Series/tutorial_texts_in_optical_engineering> ; # Tutorial texts in optical engineering ;
   schema:name "Optical imaging in projection microlithography"@en ;
   schema:productID "57594753" ;
   schema:publication <http://www.worldcat.org/title/-/oclc/57594753#PublicationEvent/bellingham_wa_spie_optical_engineering_press_2005> ;
   schema:publisher <http://experiment.worldcat.org/entity/work/data/908149#Agent/spie_optical_engineering_press> ; # SPIE Optical Engineering Press
   schema:workExample <http://worldcat.org/isbn/9780819458292> ;
   wdrs:describedby <http://www.worldcat.org/title/-/oclc/57594753> ;
    .


Related Entities

<http://experiment.worldcat.org/entity/work/data/908149#Agent/spie_optical_engineering_press> # SPIE Optical Engineering Press
    a bgn:Agent ;
   schema:name "SPIE Optical Engineering Press" ;
    .

<http://experiment.worldcat.org/entity/work/data/908149#Place/bellingham_wa> # Bellingham, WA
    a schema:Place ;
   schema:name "Bellingham, WA" ;
    .

<http://experiment.worldcat.org/entity/work/data/908149#Series/tutorial_texts_in_optical_engineering> # Tutorial texts in optical engineering ;
    a bgn:PublicationSeries ;
   schema:hasPart <http://www.worldcat.org/oclc/57594753> ; # Optical imaging in projection microlithography
   schema:name "Tutorial texts in optical engineering ;" ;
    .

<http://experiment.worldcat.org/entity/work/data/908149#Topic/imagerie_technique> # Imagerie (technique)
    a schema:Intangible ;
   schema:name "Imagerie (technique)"@en ;
    .

<http://experiment.worldcat.org/entity/work/data/908149#Topic/lithographie_halbleitertechnologie> # Lithographie (Halbleitertechnologie)
    a schema:Intangible ;
   schema:name "Lithographie (Halbleitertechnologie)"@en ;
    .

<http://experiment.worldcat.org/entity/work/data/908149#Topic/microlithographie> # Microlithographie
    a schema:Intangible ;
   schema:name "Microlithographie"@en ;
    .

<http://id.worldcat.org/fast/1019883> # Microlithography
    a schema:Intangible ;
   schema:name "Microlithography"@en ;
    .

<http://id.worldcat.org/fast/967605> # Imaging systems
    a schema:Intangible ;
   schema:name "Imaging systems"@en ;
    .

<http://viaf.org/viaf/201089371> # Alfred Kwok-Kit Wong
    a schema:Person ;
   schema:familyName "Wong" ;
   schema:givenName "Alfred Kwok-Kit" ;
   schema:name "Alfred Kwok-Kit Wong" ;
    .

<http://worldcat.org/isbn/9780819458292>
    a schema:ProductModel ;
   schema:isbn "0819458295" ;
   schema:isbn "9780819458292" ;
    .


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